AZ 12XT is a chemical enhanced positive tone photo resist (PR). In a chemical enhanced PR the exposure step creates a latent image and a week acid in the PR. The chemical reaction that makes the PR soluble in developer happens during the post exposure bake (PEB). This makes the length and temperature of the PEB extremely important. One of the advantages of the chemical enhance resits for thick resist is that it eliminate the waiting steps. The resist holds up well in RIE, DRIE, wet etching and platting. We have seen some PR cracking after gold platting but no plating in the cracks.
Users should note that this is not a DNQ resist and is not compatible with the image reversal process used in the [[Image Reversal Oven|YES-310TA]].