Changes
Jump to navigation
Jump to search
← Older edit
Plasmatherm 790/Processes/L ox350
1 byte added
,
1 year ago
→Capabilities
|-
| Deposition Rate
|
7
44
.
2 Å
5 nm
/
sec
min
|-
| Index of Refraction
| 1.
465
467
|-
| Stress
| -
380
420
MPa
|-
|}
Wrightsh
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser,
Bureaucrats
,
Interface administrators
,
Administrators
,
Widget editors
2,158
edits
Navigation menu
Personal tools
English
Log In
Namespaces
Page
Discussion
Variants
Views
Read
View source
View history
More
Search
Navigation
lnf.umich.edu
Main page
Announcements
Capabilities
User Resources
Safety
Recent changes
Random page
Help
Tools
Special pages
Printable version