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Plasmatherm 790/Processes/L nit200

12 bytes removed, 11 months ago
|-
| Deposition Rate
| 534.6 Å1 nm/secmin
|-
| Index of Refraction
| 21.00 ± 0.02998
|-
| Stress
| 50 ± 50 25 MPa
|-
|}
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