The nP12 is an atmospheric plasma tool that generates a N<sub>2</sub> plasma which scans over the wafer surface. It is used for wafer surface modification, usually [[Plasma_activation|plasma activation]] prior to [[Wafer_bonding|wafer bonding]]. Plasma activation helps to reduce the necessary bonding temperatures in many materials and enables [[Fusion_bonding|fusion bonding]] of [[Silicon|si]] substrates.