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CL200 Megasonic Cleaner

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The CL200 Megasonic Cleaner is a [[Cleaning|substrate cleaner]] that can process 100 mm or 150 mm wafers. It uses either DI or an [[RCA clean]] with a megasonic action to clean the wafers. The tool then dries the wafers via spinning with IR heating. Wafers should be cleaned in this tool before going into a bonder such as the [[EVG 520IS]] or [[SB-6E Bonder]] to reduce particulate.
==Announcements==
* [2014-07-01] [[JTB 100 Wafer Clean]] added to tool.
==Capabilities==
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser, Bureaucrats, Interface administrators, Administrators, Widget editors
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