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* Remove [[organics]] via [[JTB 100]]
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<!--A more general description of what the tool is capable of doing.-->
* Remove particulate from wafers
==System Overview==
==Supported Processes==
The CL200 has standard recipes for a megasonic clean with only DI or with DI and JTB 100. The main editable parameters are the number of scans, number of cycles, and the spin speed.
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