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Sputter deposition

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{{#ifeq: {{NAMESPACE}} | Template | | [[Category:PVD]][[Category:Processes]]}}
<!-- Set the resource ID, 5 digit # found on the scheduler -->
{{#vardefine:toolid|Electron_Beam_EvaporationSputter_Deposition}}
<!-- Set the Process Technology (see subcategories on Equipment page) -->
{{#vardefine:technology|PVD}}
{{infobox equipment
|caption =
|materials = [[Silver|Ag]], [[Aluminum|Al]], [[Aluminum oxide|Al2O3]], [[Gold|Au]], [[Chromium|Cr]], [[Copper|Cu]], [[Iron|Fe]], [[Germanium|Ge]], [[Indium|In]], [[Magnesium flouride|MgF]], [[Nickel|Ni]], [[Nichrome|NiCr]], [[Palladium|Pd]], [[Platinum|Pt]], [[Tin|Sn]], [[Silicon dioxide|SiO2]], [[Silicon monoxide|SiO]], [[Titanium|Ti]], [[Titanium dioxide|TiO2]], [[Zinc|Zn]], [[Zinc selenide|ZnSe]]
|mask =
|size = 4", 3" and 2" wafers, pieces
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser
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