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Plasmatherm 790/Processes/L nit350

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m_nit350 l_nit350 is a higher temp nitride deposition recipe for the [[Plasmatherm 790]]. It is optimized to have a lower stress and index at 2.0. 
[[Category:Processes]]
{{Infobox process
|-
| NH<sub>3</sub> Flow
| 1.8 43 sccm
|-
| N<sub>2</sub> Flow
| 1500 160 sccm
|-
| SiH<sub>4</sub> Flow
|-
| Deposition Rate
| 5.9 Å/sec
|-
| Index of Refraction
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