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Detailed characterization data for the etch can be found [ https: //drive. google. com/a/lnf.umich.edu/file/d/0B76AgohVTgqdeVltQ0dKTVo5akU/preview here] .
Etch rate is feature size dependent - smaller features will etch slower than larger ones. Bulk etch rate is approximately
2600 Å/min. The etch exhibits minimal [[loading]] effect.
The etch rate of [[SPR 220]] is approximately
100 nm/min , giving a selectivity of ~2.5:1. Selectivity will be lower on smaller features, due to the decrease in oxide etch rate.