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Acid Bench 73

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{{underlinked}}<!-- Set the resource ID, 5 digit # found on the scheduler -->{{#vardefine:toolid|71231}}<!-- Set the Process Technology (see subcategories on Equipment page) -->{{#vardefine:technology|Wet bench}}<!-- Set the Material Restriction Level: 1 = CMOS Clean, 2 = Semi-Clean, 3 = Metals -->{{#vardefine:restriction|3}}
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|chemicals = [[:Category:Acetic Acid|AcidsAcetic Acid (C<sub>2</sub>H<sub>4</sub>O<sub>2</sub>)]] [[Aluminum Etch|Aluminum Etch]] [[Buffered HF|Buffered HF (BHF)]] [[Hydrofluoric acid|Hydrofluoric acid (HF)]] [[Chromium Etch|Chromium Etch]] [[Hydrochloric acid|Hydrochloric acid (HCl)]] [[Hydrogen peroxide|Hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>)]] [[Gold Etch|Gold Etch]] [[Nanostrip|Nanostrip]] [[Nitric acid|Nitric acid (HNO<sub>3</sub>)]] [[Phosphoric Acid|Phosphoric Acid (H<sub>3</sub>O<sub>4</sub>P)]] [[Sulfuric acid|Sulfuric acid (H<sub>2</sub>SO<sub>4</sub>)]] 
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|overview = [[{{PAGENAME}}#System_Overview System_overview | System Overview]]|sop = [ SOP]<!--|processes = [[{{PAGENAME}}/Processes|Supported Processes]]|userprocesses = [[LNF_User:{{PAGENAME}}_User_Processes|User Processes]]-->
|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]]
{{warning|This page has not been released yet.}} Acid Bench 73 is a wet bench used for working with [[acids]], mostly for [[Wet etching|etching ]] and [[cleaning ]] of samples that have had metals and/or polymers on them. It is considered a [[Metals]] benchclass tool, so wafers with metal are allowed in the benchwith some restrictions. It is intended for use with mixed materials and all substrate sizes up to 6 inches with the main focus being on piece parts.
Acid Bench 73 is for wet processing of with piece parts, 4, and 6 inch samples of mixed materials. This includes III-V and II-VI materials, samples with polymers, and irregularly shaped samples.
* Feedback controlled hotplate
* Rinse tank can be run as either a [[Quick dump rinse]] (QDR) or [[Overflow]] overflow/cascade tank.
* Sink with goose neck
* Automated Bottle Wash
* Aspirator for chemical cleanup
==System Overviewoverview=====LNF Provided Chemicals Allowed===* [[Acetic Acidacid|Acetic Acid (C<sub>2</sub>H<sub>4</sub>O<sub>2</sub>)]]
* [[Aluminum Etch|Aluminum Etch]]
* [[Buffered HF|Buffered HF (BHF)]]
* [[Hydrofluoric acid|Hydrofluoric acid (HF)]]
* [[Chromium Etch|Chromium Etch1020]]
* [[Hydrochloric acid|Hydrochloric acid (HCl)]]
* [[Hydrogen peroxide|Hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>)]]
* [[Gold Etch|Gold EtchGE-8111]]
* [[Nanostrip|Nanostrip]]
* [[Nitric acid|Nitric acid (HNO<sub>3</sub>)]]
* [[Phosphoric Acidacid|Phosphoric Acid (H<sub>3</sub>OPO<sub>4</sub>P)]]
* [[Sulfuric acid|Sulfuric acid (H<sub>2</sub>SO<sub>4</sub>)]]
===Hardware Detailsdetails===
* Feedback control hot plate
* [[Quick dump rinse]] (QDR)/Cascade tank* Automatic Bottle washWash
* Sink with goose neck
* Open deck space
Working with chemicals can be very dangerous. Chemicals used at this bench are some of the most hazardous in the lab. To minimize the chance of accident, make sure you always:
*Wear personal protective equipment. Required PPE at this bench is an apron, face shield, and Trionic gloves.
*[ LNF Glove Policy]*Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them (review Safety Data Sheet (SDS)) or asking ask staff.
*Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
*Only process 4” and 6” wafers.
*Do not use this bench without proper training.
*Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers.
**No solvents can be used or disposed of here.
**Solutions which contains toxic materials that cannot be removed by neutralization (such as gold etch and chromium etch) should must not be aspirated or disposed of down the drain.
===Substrate Requirementsrequirements===
* Piece Part to 6 inch wafers
* Open to all approved substrates/materials
** Some materials may require the use of private beakers
===Material Restrictionsrestrictions===
{{material restrictions}}
==Supported Processesprocesses== {{expand section}}<!-- We recommend creating a subpage detailing the supported processes for the tool, which will be generated if you leave the link below. Alternatively, you may include the information on this page. In that case, the Supported Processes document from the equipment manual can be included here, using {{#widget:GoogleDoc|key=1AduVT6p3tAV6EG-5MHiml61evDzBGSkPUws4AL0k1xw}} --> 
There are several processes for this tool supported by the LNF, which are described in more detail on the [[/Acid 73 Processes/]] page.
There are a variety of chemical processes that can be performed on this bench, including:
These Process Include:
* [[Aluminum Etch|Aluminum Etch]]
* [[Aqua Regia|Aqua Regia]]
* [[BHFBuffered HF|BHF]]
* [[Chromium Etch|Chromium Etch]]
* [[Dilute HF (49% - 100:1 DI:HF)Hydrofluoric acid|Dilute HF]]
* [[Gold Etch|Gold Etch]]
* [[Nanostrip|Nanostrip]]
* [[Piranha Etch|Piranha Etch]]
* [ RCA Clean]
If you you have a process that is not listed here please open a '''help desk ticket''' so your process can wish to perform any other processes on this bench, they must be approved and documented. <!-- If you allow custom recipes, let users know to contact by a tool engineer, and you may also create the link below which will . Please create a page that users can add custom recipes to[ helpdesk ticket] for assistance. <!-->
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on [[LNF User:{{BASEPAGENAME}} User Processes|{{BASEPAGENAME}} User Processes]]. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
==Standard Operating Procedureoperating procedure==
<!-- To include a document from google docs, use the line below, replace "googledocid" with the ID for the document. Remember, to make this visible, you must set Sharing for the document to "Anyone with the link can view". -->
For a document version of the SOP, see below{{#widget:GoogleDoc|key=1OMOmAtD_8ezwLhNo2_KHl8ktVytkX_97HSV8_1E9Nbg1pLrVuX6vgnqKQnUe667W7PxQ3KjdElpmm93n3Q5qzzk}}
==Checkout Procedureprocedure==
<!-- Describe the checkout procedure for the tool. For example: -->
Checkout on Acid Bench 73 also includes checkout [[Acid Bench 72]], and [[Acid Bench 82]]. Please be prepared for this when you reach steps 5 and 6.
# Take the [[General Wet Bench Training]], if you haven't already.
# Read through this page and the Standard Operating Procedure above.
# Practice with your mentor or another authorized user until you are comfortable with tool operation.
# Open a Helpdesk ticket and request a checkoutFill out [https://docs. # A tool engineer Process Information Form]. You will schedule a time need to fill this out for checkouteach bench you plan on using.
# Complete the [ 1440 Acid Bench quiz].
# Open a [ helpdesk ticket] and request a checkout.
# If you pass the quiz the tool engineer will authorize you on the tool. If not you will be contacted to repeat.
<!-- Describe standard maintenance/qualification tests here -->
There are no staff maintained processes ===User Allowed===* If you break a nitrogen gun or tanks at this a DI water gun, go in the back service aisle to turn off the inlet to the bench.* Contact staff via Helpdesk system
OnlineAccess, PhysicalAccess, Staff, StoreManager, StoreUser


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