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Acid Bench 73

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[[Hydrochloric acid|Hydrochloric acid (HCl)]]
 
[[Hydrogen peroxide|Hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>)]]
 
[[Gold Etch|Gold Etch]]
 
[[Nanostrip|Nanostrip]]
 
[[Nitric acid|Nitric acid (HNO<sub>3</sub>)]]
 
[[Phosphoric Acid|Phosphoric Acid (H<sub>3</sub>O<sub>4</sub>P)]]
 
[[Sulfuric acid|Sulfuric acid (H<sub>2</sub>SO<sub>4</sub>)]]
 
|gases =
|overview = [[{{PAGENAME}}#System_Overview | System Overview]]
{{warning|This page has not been released yet.}}
Acid Bench 73 is a wet bench used for working with [[:Category:Acid|Acids]]acids, mostly for etching and cleaning of samples that have had metals and/or polymers on them. It is considered a [[Metals]] class tool, so wafers with metal are allowed in the bench. It is intended for use with mixed materials and all substrate sizes up to 6 inches with the main focus being on piece parts.
==Announcements==
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