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ACS 200 cluster tool

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This tool is an Automated Photoresist coating, baking and developing tool. It can run full 4" and 6" cassettes of wafers at a time. It's capable of having multiple paths running simultaneously (ie., coating and developing from two different cassettes). It automatically pumps spr 220(3.0) and 1813 photoresists. Other resists can be set up to automatically dispense from a syringe. The spinner's closed lid option can help aid with more uniform sidewall coating. HMDS is applied via vapor prime. Both developers are CMOS compatible (MF319, and MF300). Developer The developer temperature is very closely controlledto within 0.1 degrees C throughout the process.
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