Spin Rinse Dryer
| Spin Rinse Dryer | |
|---|---|
|
[[File:
| |
| Equipment Details | |
| Technology | Process Technology |
| Materials Restriction | Undefined |
| Material Processed | wafers |
| Sample Size | 4" or 6" |
| Chemicals Used | DI water |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | SOP |
| Supported Processes | Supported Processes |
| User Processes | User Processes |
| Maintenance | Maintenance |
The Spin Rinse Dryer or SRD is a tool used for cleaning, rinsing, and drying wafers after wet processing. The SRDs are single cassette, front-loading rinser/dryers capable of rinsing either 4" or 6" wafers. After being rinsed with DI water, the cassettes are dried primarily through spinning while liquid droplets on the bowl are evaporated using heated Nitrogen.
Contents
Announcements
The Acid 92 and RCA 81 Spin Rinse Dryers have been sent to Sitek for maintenance
Capabilities
The SRD can spin, rinse, and dry semiconductor wafers without leaving water spots and films after a wet process. Spin Rinse Dryers use DI water that is set to a resistivity setpoint of 16.0.
Recipe 0: Rinse recipe Recipe 1: Standard rinse and dry Recipe 2: Standard rinse and slow dry
Always run Recipe 0 before using any of the CMOS clean Spin Rinse Dryers.
SRDs Available
The following is a list of SRDs that are available in both the cleanroom and the ROBIN lab.
S/N 13871
- Location: ROBIN Lab 1436
- Associated Benches: Acid Bench 92, Solvent Bench 94, Base Bench 91
- 4" wafers
- Single Recipe Available
SRD-81-1440A
- RCA clean only
- Location: 1440A
- Associated Benches: RCA Bench 81
- 4" wafers
- Single recipe available
B-SRD-82-1440A B
- Location: 1440A
- Associated Benches: Solvent Bench 83, Solvent Bench 84, Acid Bench 80
- 4" wafers
- No program function available - recipes not standardized
B-SRD-82-1440A B
- Location: 1440A
- Associated Benches: Solvent Bench 83, Solvent Bench 84, Acid Bench 80
- 6" wafers
- No program function available - recipes not standardized
SRD-71-1440B
- Location: 1440B
- Associated Benches: Acid Bench 73
- 4" wafers
- Manual Recipe Program
SRD-11-1480B
- Location: 1480B
- Associated Benches: Acid Bench 12, Solvent Bench 14
- 6" wafers
SRD-12-1480B
- Location: 1480B
- Associated Benches: Acid Bench 12, Solvent Bench 14
- 4" wafers
SRD-01-1480C
- PFC only
- Location: 1480C
- Associated Benches: PFC Bench 01
- 6" wafers
SRD-02-1480C
- PFC only
- Location: 1480C
- Associated Benches: PFC Bench 01
- 4" wafers
SRD-03-1480C
- Location: 1480C
- Associated Benches: Acid Bench 02
- 6" wafers
SRD-04-1480C
- Location: 1480C
- Associated Benches: Acid Bench 02
- 4" wafers
Material restrictions
SRD-81-1440A is considered semi-clean and is used for substrates which 1) do not need to go into the furnaces, or 2) have been been through the non-CMOS-clean processes of chemical mechanical polishing, KOH etch, or AZ 400K developer, or which need to go back into furnaces.
SRD-01-1480C and SRD-02-1480C are considered CMOS-clean. Silicon substrates, high purity fused silica, and CMOS-clean furnace-grown silicon, silicon dioxide, and silicon nitride thin films are allowed in this SRD. No metals, photoresist or glass wafers (except high purity fused silica) are allowed. Wafers are not allowed in this SRD or in the furnaces if they have ever had metal on them. SRD 01 and 02 are only to be used to process wafers that are on the last step of the PFC process.
Silicon wafers that have been processed in non-CMOS-clean chemicals and tools are not allowed. Wafers that have been processed through any wet benches other than Acid 02 or RCA 81 cannot be cleaned in PFC 01.
Supported processes
There are several standard recipes that are set up for this tool and supported by the LNF, which are described in more detail below. Recipe 0 is used to clean the SRD. Recipe 1 is the standard rinse and dry recipe. Recipe 2 is a slow recipe used for fragile wafers.
The quick reference guide to using the SRD is found below: Widget text will go here.
If you are curious if your recipe can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
Checkout procedure
- Read through this page and the corresponding bench wiki page.
- Create a Helpdesk ticket requesting training for the corresponding bench.
- A tool engineer will schedule a time for initial training.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the bench and the corresponding SRD.
Maintenance
The following is a list of common HELP errors that can occur on the SRD.
Use Recipe 0 before use to rinse out the tank
