Stripping resist
Jump to navigation
Jump to search
| This page has not been released yet. |
| About this Process | |
|---|---|
| Process Details | |
| Equipment | Stripping resist |
| Technology | [[]] |
Photoresist stripping is the removal of photoresist layers from a substrate. The purpose is to eliminate the photoresist without allowing the materials underneath to get attacked.
Procedure
There are two possible routes to stripping resist: wet strip or dry strip.
Widget text will go here.