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A description for this chemical needs to be added.
- TMAH should never be poured down the drain. it is extremely toxic to aquatic life even after neutralization. it should be collected in hazardous waste bottles to be disposed of via EHS.
- Tetramethylammonium hydroxide is a common ingredient in many of the developers in the lab. A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. TMAH based developers are used to then develop these photoresists. In the cleanroom, developing is done at Base Bench 63. It is also used in etching processes in the ROBIN.
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Safety Data Sheet
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