Topic on Talk:Plasma Enhanced Chemical Vapor Deposition

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Parameters

This topic was hidden by Kjvowen
Reason: Approved
4
Kjvowen (talkcontribs)

Indecisive on whether it's useful to point out which tools can do it or not, but definitely don't put that information in the heading.

Bkarmstr (talkcontribs)

Removed "P5000 PECVD Only" from the heading and made note of this in text below for Showerhead to susceptor spacing.

Kjvowen (talkcontribs)

As we discussed in the meeting, make the RF power section more "universal" (either main power or bias theoretically could be either high or low frequency, but you can say "usually xyz" for each one)

Bkarmstr (talkcontribs)

Generalized RF Power section to Primary and Secondary (bias) RF and noted what is typically used for capacitively coupled systems.