ZEP520A is high performance positive EB resists which show high resolution, high sensitivity and dry etch resistance.
They are suitable for various EB processes:
(1) Resolution: 8nm line width achievable with 50nm thick resist
(2) Resistance to dry etching: Shows high dry etch resistance and they are almost equivalent to that of positive photoresists generally used
(3) Sensitivity: Shows high sensitivity
Technical Data Sheet for ZEP520A e-beam resist