ACS 200 cluster tool
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ACS 200 cluster tool | |
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Equipment Details | |
Technology | Lithography |
Materials Restriction | Semi-Clean |
Material Processed | SPR 220, SPR 955 0.9, and LNF approved photo resist syringes |
Chemicals Used | MF 300, MF 319, EBR, Acetone, HMDS |
Equipment Manual | |
Overview | System Overview |
Supported Processes | Supported Processes |
User Processes | User Processes |
Maintenance | Maintenance |
The ACS 200 cluster tool has been decommissioned. Please use the TEL Mark Vz Coater.