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ACS 200 cluster tool
Equipment Details
Technology Lithography
Materials Restriction Semi-Clean
Material Processed SPR 220, SPR 955 0.9, and LNF approved photo resist syringes
Chemicals Used MF 300, MF 319, EBR, Acetone, HMDS
Equipment Manual
Overview System Overview
Supported Processes Supported Processes
User Processes User Processes
Maintenance Maintenance

The ACS 200 cluster tool has been decommissioned. Please use the TEL Mark Vz Coater.