Difference between revisions of "AZ 12XT"

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{{warning|This page has not been released yet.}}
 
{{warning|This page has not been released yet.}}
  
Az 12XT is a chemical enhanced positive tone photo resist (PR). Being a chemical enhanced PR the exposure creates a latent image and a week acid in the PR. The chemical reaction that makes the PR soluble in developer happens during the post exposure bake (PEB). This makes the length and temperature of the PEB extremely important.
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Az 12XT is a chemical enhanced positive tone photo resist (PR). In a chemical enhanced PR the exposure step creates a latent image and a week acid in the PR. The chemical reaction that makes the PR soluble in developer happens during the post exposure bake (PEB). This makes the length and temperature of the PEB extremely important. One of the advantages of the chemical enhance resits for thick resist is that it eliminate the waiting steps.  
  
 
==Equipment==
 
==Equipment==
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* Solvent Bunker
 
* Solvent Bunker
  
==Hazards==
 
===Chemicals===
 
What makes up this chemical
 
===Properties===
 
What are properties of this chemical
 
 
==Processes==
 
==Processes==
 
* There are currently no processes defined that use this chemical.
 
* There are currently no processes defined that use this chemical.
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==Technical Data Sheet==
 
==Technical Data Sheet==
* There are currently no data sheets for this chemical.
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* [AZ 12xt Technical Datasheet| https://drive.google.com/file/d/1JzyiG9o0T74NMCGicedBsqQanjQH4jT2/view?usp=sharing]
  
 
==Safety Data Sheet==
 
==Safety Data Sheet==

Revision as of 14:43, 25 August 2021


Warning Warning: This page has not been released yet.

Az 12XT is a chemical enhanced positive tone photo resist (PR). In a chemical enhanced PR the exposure step creates a latent image and a week acid in the PR. The chemical reaction that makes the PR soluble in developer happens during the post exposure bake (PEB). This makes the length and temperature of the PEB extremely important. One of the advantages of the chemical enhance resits for thick resist is that it eliminate the waiting steps.

Equipment

  • CEE 100CB photoresist spinner

Storage Locations

  • Solvent Bunker

Processes

  • There are currently no processes defined that use this chemical.

Process SOPs

  • There are currently no process SOPs defined for this chemical.

Hazardous Waste

How is this chemical disposed of or collected

Technical Data Sheet

Safety Data Sheet

  • There are currently no Safety Data Sheets (SDSes) for this chemical.

References

  • Other links that are useful