Difference between revisions of "Acid Bench 12"

From LNF Wiki
Jump to navigation Jump to search
Line 1: Line 1:
−
{{cleanup-boilerplate|boilerplate=Equipment}}
+
{{#vardefine:toolid|71011}}{{#vardefine:technology|Wet bench}}{{#vardefine:restriction|3}}{{infobox equipment
−
<!-- Set the resource ID, 5 digit # found on the scheduler -->
 
−
{{#vardefine:toolid|71011}}
 
−
<!-- Set the Process Technology (see subcategories on Equipment page) -->
 
−
{{#vardefine:technology|Wet bench}}
 
−
<!-- Set the Material Restriction Level: 1 = CMOS Clean, 2 = Semi-Clean, 3 = Metals -->
 
−
{{#vardefine:restriction|3}}
 
−
{{cleanup-infobox}}
 
−
{{infobox equipment
 
 
|caption = Acid Bench 12
 
|caption = Acid Bench 12
 
|materials = Silicon and Glass wafers
 
|materials = Silicon and Glass wafers
Line 28: Line 20:
 
}}
 
}}
  
−
{{warning|This page has not been released yet.}}
+
[[{{PAGENAME}}]] is used for working with acids, mostly for [[etching metals]], pattering and cleaning substrates that have had metals on them.  It is considered a  metals bench, so wafers with metal are allowed in the bench with some restrictions.  It is intended for use with 4” and 6” Si and glass substrates only. Only the processes listed below are allowed in this bench.
−
 
 
−
<!-- Insert the tool description here -->
 
−
This wet bench is used for working with acids, mostly for [[etching metals]], pattering and cleaning substrates that have had metals on them.  It is considered a  metals bench, so wafers with metal are allowed in the bench with some restrictions.  It is intended for use with 4” and 6” Si and glass substrates only. Only the processes listed below are allowed in this bench.
 
 
   
 
   
 
==Announcements==
 
==Announcements==

Revision as of 14:47, 13 September 2016

Acid Bench 12
71011.jpg
Acid Bench 12
Equipment Details
Technology Wet bench
Materials Restriction Metals
Material Processed Silicon and Glass wafers
Sample Size 4" and 6"
Chemicals Used
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Processes
Maintenance Maintenance


Acid Bench 12 is used for working with acids, mostly for etching metals, pattering and cleaning substrates that have had metals on them. It is considered a metals bench, so wafers with metal are allowed in the bench with some restrictions. It is intended for use with 4” and 6” Si and glass substrates only. Only the processes listed below are allowed in this bench.

Announcements

  • Update this with announcements as necessary

System Overview

Chemicals Allowed

Hardware Details

This bench contains 2 heated chemical baths, DI quick dump rinse tank (QDR), timers, and 4 unheated chemical baths.

Safety

Proper PPE for this bench are apron, face shield, trionic gloves and safety glasses
Warning Warning: You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab.

Working with chemicals can be very dangerous. Chemicals used at this bench are some of the most hazardous in the lab. To minimize the chance of accident, make sure you always:

  • Wear personal protective equipment. Required PPE at this bench is an apron, face shield, and Trionic gloves.
  • Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
  • Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
  • Only process 4” and 6” wafers.
  • Do not use this bench without proper training.
  • Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers.
    • No solvents can be used or disposed of here.
    • Solutions which contains toxic materials that cannot be removed by neutralization (such as gold and chromium etch) should not be aspirated or disposed of down the drain.

Substrate Requirements

  • 4 and 6 inch wafers
  • Glass and Silicon

Material Restrictions

The Acid Bench 12 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.

Approved materials


Supported Processes

Main article: Acid Bench 12/Processes

LNF Standard Processes in this bench

Widget text will go here.


Standard Operating Procedure

Widget text will go here.

Checkout Procedure

  1. Take the General Wet Bench Training, if you haven't already.
  2. Read through this page and the Standard Operating Procedure above.
  3. Practice with your mentor or another authorized user until you are comfortable with tool operation.
  4. Open a helpdesk ticket and request a checkout.
  5. A tool engineer will schedule a time for checkout.
  6. Complete the Acid Bench 12 quiz.
  7. If you pass the quiz the tool engineer will authorize you on the tool. If not you will be contacted to repeat.

Maintenance

  • Bench is checked for issues twice a week during lab clean
  • Nanostrip is changed weekly
  • Chrome etch and gold etch are changed monthly

User supported maintenance

Please only make the following changes if you have been trained and are comfortable doing this. If you have an issue that is not detailed or are not trained please create a helpdesk ticket.

Chemical Change

Broken DI Gun

Broken Nitrogen Gun

Widget text will go here.

Retrieved from "https://lnf-wiki.eecs.umich.edu/wiki/index.php?title=Acid_Bench_12&oldid=13408"