Difference between revisions of "Acid Bench 73"

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<!-- Set the resource ID, 5 digit # found on the scheduler -->
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{{#vardefine:toolid|71231}}{{#vardefine:technology|Wet bench}}{{#vardefine:restriction|3}}
{{#vardefine:toolid|71231}}
 
<!-- Set the Process Technology (see subcategories on Equipment page) -->
 
{{#vardefine:technology|Process Technology}}
 
<!-- Set the Material Restriction Level: 1 = CMOS Clean, 2 = Semi-Clean, 3 = Metals -->
 
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{{infobox equipment
 
{{infobox equipment
 
|caption =  
 
|caption =  
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|mask =
 
|mask =
 
|size =
 
|size =
|chemicals = [[:Category:Acids|Acids]]
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|chemicals = [[Acetic Acid|Acetic Acid (C<sub>2</sub>H<sub>4</sub>O<sub>2</sub>)]]
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[[Aluminum Etch|Aluminum Etch]]
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[[Buffered HF|Buffered HF (BHF)]]
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[[Hydrofluoric acid|Hydrofluoric acid (HF)]]
 +
 
 +
[[Chromium Etch|Chromium Etch]]
 +
 
 +
[[Hydrochloric acid|Hydrochloric acid (HCl)]]
 +
 
 +
[[Hydrogen peroxide|Hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>)]]
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[[Gold Etch|Gold Etch]]
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[[Nanostrip|Nanostrip]]
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[[Nitric acid|Nitric acid (HNO<sub>3</sub>)]]
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[[Phosphoric Acid|Phosphoric Acid (H<sub>3</sub>O<sub>4</sub>P)]]
 +
 
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[[Sulfuric acid|Sulfuric acid (H<sub>2</sub>SO<sub>4</sub>)]]
 +
 
 
|gases =  
 
|gases =  
|overview = [[{{PAGENAME}}#System_Overview | System Overview]]
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|overview = [[{{PAGENAME}}#System_overview | System Overview]]
|sop = [https://link.to.google.doc/preview SOP]
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|sop = [https://docs.google.com/document/d/1AduVT6p3tAV6EG-5MHiml61evDzBGSkPUws4AL0k1xw/preview SOP]
|processes = [[{{PAGENAME}}/Processes|Supported Processes]]
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<!--|processes = [[{{PAGENAME}}/Processes|Supported Processes]]
|userprocesses = [[LNF_User:{{PAGENAME}}_User_Processes|User Processes]]
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|userprocesses = [[LNF_User:{{PAGENAME}}_User_Processes|User Processes]] -->
 
|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]]
 
|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]]
 
}}
 
}}
  
{{warning|This page has not been released yet.}}
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Acid Bench 73 is a wet bench used for working with acids, mostly for [[Wet etching|etching]] and [[cleaning]] of samples that have had metals and/or polymers on them. It is considered a [[Metals]] class tool, so wafers with metal are allowed in the bench with some restrictions. It is intended for use with mixed materials and all substrate sizes up to 6 inches with the main focus being on piece parts.
 
 
<!-- Insert the tool description here -->
 
  
 
==Announcements==
 
==Announcements==
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==Capabilities==
 
==Capabilities==
 
<!--A more general description of what the tool is capable of doing.-->
 
<!--A more general description of what the tool is capable of doing.-->
*The Acid Bench 73 is for wet processing of with piece parts, 4, and 6 inch samples of mixed materials. This includes 3-5 and 2-6 materials, samples with polymers, and irregularly shaped samples. Wafers that are going into furnaces or other CMOS-clean tools should not be processed in Acid Bench 73.
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Acid Bench 73 is for wet processing of with piece parts, 4, and 6 inch samples of mixed materials. This includes III-V and II-VI materials, samples with polymers, and irregularly shaped samples.  
 +
* Feedback controlled hotplate
 +
* Rinse tank can be run as either a [[Quick dump rinse]] (QDR) or overflow/cascade tank.
 +
* Sink with goose neck
 +
* Automated Bottle Wash
 +
* Aspirator for chemical cleanup
 +
 
 +
==System overview==
 +
===LNF Provided Chemicals===
 +
* [[Acetic acid|Acetic Acid (C<sub>2</sub>H<sub>4</sub>O<sub>2</sub>)]]
 +
* [[Aluminum Etch|Aluminum Etch]]
 +
* [[Buffered HF|Buffered HF (BHF)]]
 +
* [[Hydrofluoric acid|Hydrofluoric acid (HF)]]
 +
* [[Chromium Etch|Chromium Etch 1020]]
 +
* [[Hydrochloric acid|Hydrochloric acid (HCl)]]
 +
* [[Hydrogen peroxide|Hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>)]]
 +
* [[Gold Etch|Gold Etch GE-8111]]
 +
* [[Nanostrip|Nanostrip]]
 +
* [[Nitric acid|Nitric acid (HNO<sub>3</sub>)]]
 +
* [[Phosphoric acid|Phosphoric Acid (H<sub>3</sub>PO<sub>4</sub>)]]
 +
* [[Sulfuric acid|Sulfuric acid (H<sub>2</sub>SO<sub>4</sub>)]]
  
==System Overview==
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===Hardware details===
===Hardware Details===
 
 
* Feedback control hot plate
 
* Feedback control hot plate
* QDR/Cascade tank
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* [[Quick dump rinse]] (QDR)/Cascade tank
* Bottle wash
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* Automatic Bottle Wash
 
* Sink with goose neck
 
* Sink with goose neck
 
* Open deck space
 
* Open deck space
  
===Substrate Requirements===
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===Safety===
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{{Tip|Proper PPE for this bench are apron, face shield, trionic gloves and safety glasses}}
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{{warning|You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab.}}
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Working with chemicals can be very dangerous.  Chemicals used at this bench are some of the most hazardous in the lab.  To minimize the chance of accident, make sure you always:
 +
*Wear personal protective equipment.  Required PPE at this bench is an apron, face shield, and Trionic gloves.
 +
*[http://lnf-wiki.eecs.umich.edu/wiki/LNF_Glove_Policy LNF Glove Policy]
 +
*Know the properties and hazards of chemicals you are working with.  If you don’t know, find out by reading about them (review Safety Data Sheet (SDS)) or ask staff.
 +
*Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use.  Plan how you will rinse your sample and what you will do with any waste generated.  Make sure you know how the controllers work.
 +
*Do not use this bench without proper training.
 +
 
 +
*Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers. 
 +
**No solvents can be used or disposed of here. 
 +
**Solutions which contains toxic materials that cannot be removed by neutralization (such as gold etch and chromium etch) must not be disposed of down the drain.
 +
 
 +
===Substrate requirements===
 
* Piece Part to 6 inch wafers
 
* Piece Part to 6 inch wafers
 
* Open to all approved substrates/materials
 
* Open to all approved substrates/materials
 
** Some materials may require the use of private beakers
 
** Some materials may require the use of private beakers
  
===Material Restrictions===
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===Material restrictions===
 
{{material restrictions}}
 
{{material restrictions}}
  
==Supported Processes==  
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==Supported processes==  
<!-- We recommend creating a subpage detailing the supported processes for the tool, which will be generated if you leave the link below. Alternatively, you may include the information on this page. In that case, the Supported Processes document from the equipment manual can be included here, using {{#widget:GoogleDoc|key=1AduVT6p3tAV6EG-5MHiml61evDzBGSkPUws4AL0k1xw}} -->
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<!--
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There are several processes for this tool supported by the LNF, which are described in more detail on the [[/Acid 73 Processes/]] page.
 +
-->
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There are a variety of chemical processes that can be performed on this bench, including:
  
There are several processes for this tool supported by the LNF, which are described in more detail on the [[/Processes/]] page.
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* [[Aluminum Etch|Aluminum Etch]]
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* [[Aqua Regia|Aqua Regia]]
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* [[Buffered HF|BHF]]
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* [[Chromium Etch|Chromium Etch]]
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* [[Hydrofluoric acid|Dilute HF]]
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* [[Gold Etch|Gold Etch]]
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* [[Nanostrip|Nanostrip]]
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* [[Piranha Etch|Piranha Etch]]
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* [https://docs.google.com/document/d/1k80B6EGYPKdMVfGalNYDWM6k8DWNAIQOAiaxW7Y5gx0/edit?usp=sharing RCA Clean]
  
<!-- If you allow custom recipes, let users know to contact a tool engineer, and you may also create the link below which will create a page that users can add custom recipes to. -->
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If you wish to perform any other processes on this bench, they must be approved by a tool engineer.  Please create a [http://ssel-sched.eecs.umich.edu/sselonline/?view=/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:71231 helpdesk ticket] for assistance.
 +
<!--
 
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on [[LNF User:{{BASEPAGENAME}} User Processes|{{BASEPAGENAME}} User Processes]]. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
 
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on [[LNF User:{{BASEPAGENAME}} User Processes|{{BASEPAGENAME}} User Processes]]. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
 +
-->
  
==Standard Operating Procedure==
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==Standard operating procedure==
 
<!-- To include a document from google docs, use the line below, replace "googledocid" with the ID for the document. Remember, to make this visible, you must set Sharing for the document to "Anyone with the link can view". -->
 
<!-- To include a document from google docs, use the line below, replace "googledocid" with the ID for the document. Remember, to make this visible, you must set Sharing for the document to "Anyone with the link can view". -->
{{#widget:GoogleDoc|key=1OMOmAtD_8ezwLhNo2_KHl8ktVytkX_97HSV8_1E9Nbg}}
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For a document version of the SOP, see below
 +
{{#widget:GoogleDoc|key=1pLrVuX6vgnqKQnUe667W7PxQ3KjdElpmm93n3Q5qzzk}}
  
==Checkout Procedure==
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==Checkout procedure==
 
<!-- Describe the checkout procedure for the tool. For example: -->
 
<!-- Describe the checkout procedure for the tool. For example: -->
# Take the [[General Wet Bench Training]]  
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# Take the [[General Wet Bench Training]], if you haven't already.
 
# Read through this page and the Standard Operating Procedure above.
 
# Read through this page and the Standard Operating Procedure above.
 
# Practice with your mentor or another authorized user until you are comfortable with tool operation.
 
# Practice with your mentor or another authorized user until you are comfortable with tool operation.
# Complete the training request form for 1440 Acid Bench Training [https://docs.google.com/a/lnf.umich.edu/forms/d/1sj_2Q9tB7F3INM-PqBUmV_GWRoQzpXDvDZ96zfum0qI/viewform].
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# Fill out [https://docs.google.com/forms/d/e/1FAIpQLScv9PDTq-3nFVrJf_9HG0xi7wZNZVCEVTcW-IhgWFhlnkds4g/viewform?usp=sf_link Process Information Form]. You will need to fill this out for each bench you plan on using.
# A tool engineer will schedule a time for training.
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# Complete the [https://docs.google.com/a/lnf.umich.edu/forms/d/1IwHwa3JEJGcszwkrxN2yk-TBiL1SU6uSMczmbZ72MMk/viewform 1440 Acid Bench quiz].
# Complete the quiz [https://docs.google.com/a/lnf.umich.edu/forms/d/1IwHwa3JEJGcszwkrxN2yk-TBiL1SU6uSMczmbZ72MMk/viewform].
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# Open a [http://ssel-sched.eecs.umich.edu/sselonline/?view=/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:71231 helpdesk ticket] and request a checkout.  
# If you pass the quiz the tool engineer will authorize you on the tool.  If not you will be contacted to repeat.  
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# If you pass the quiz the tool engineer will authorize you on the tool.  If not you will be contacted to repeat.
  
==Tool Qualification==  
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==Maintenance==  
 
<!-- Describe standard maintenance/qualification tests here -->
 
<!-- Describe standard maintenance/qualification tests here -->
There are no staff maintained processes or tanks at this bench.
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===User Allowed===
 +
* If you break a nitrogen gun or a DI water gun, go in the back service aisle to turn off the inlet to the bench
 +
* Contact staff via Helpdesk system

Latest revision as of 07:06, 22 February 2022

Acid Bench 73
71231.jpg
Equipment Details
Technology Wet bench
Materials Restriction Metals
Chemicals Used

Acetic Acid (C2H4O2)

Aluminum Etch

Buffered HF (BHF)

Hydrofluoric acid (HF)

Chromium Etch

Hydrochloric acid (HCl)

Hydrogen peroxide (H2O2)

Gold Etch

Nanostrip

Nitric acid (HNO3)

Phosphoric Acid (H3O4P)

Sulfuric acid (H2SO4)
Equipment Manual
Overview System Overview
Operating Procedure SOP
Maintenance Maintenance


Acid Bench 73 is a wet bench used for working with acids, mostly for etching and cleaning of samples that have had metals and/or polymers on them. It is considered a Metals class tool, so wafers with metal are allowed in the bench with some restrictions. It is intended for use with mixed materials and all substrate sizes up to 6 inches with the main focus being on piece parts.

Announcements

  • Update this with announcements as necessary

Capabilities

Acid Bench 73 is for wet processing of with piece parts, 4, and 6 inch samples of mixed materials. This includes III-V and II-VI materials, samples with polymers, and irregularly shaped samples.

  • Feedback controlled hotplate
  • Rinse tank can be run as either a Quick dump rinse (QDR) or overflow/cascade tank.
  • Sink with goose neck
  • Automated Bottle Wash
  • Aspirator for chemical cleanup

System overview

LNF Provided Chemicals

Hardware details

  • Feedback control hot plate
  • Quick dump rinse (QDR)/Cascade tank
  • Automatic Bottle Wash
  • Sink with goose neck
  • Open deck space

Safety

Proper PPE for this bench are apron, face shield, trionic gloves and safety glasses
Warning Warning: You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab.

Working with chemicals can be very dangerous. Chemicals used at this bench are some of the most hazardous in the lab. To minimize the chance of accident, make sure you always:

  • Wear personal protective equipment. Required PPE at this bench is an apron, face shield, and Trionic gloves.
  • LNF Glove Policy
  • Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them (review Safety Data Sheet (SDS)) or ask staff.
  • Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
  • Do not use this bench without proper training.
  • Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers.
    • No solvents can be used or disposed of here.
    • Solutions which contains toxic materials that cannot be removed by neutralization (such as gold etch and chromium etch) must not be disposed of down the drain.

Substrate requirements

  • Piece Part to 6 inch wafers
  • Open to all approved substrates/materials
    • Some materials may require the use of private beakers

Material restrictions

The Acid Bench 73 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported processes

There are a variety of chemical processes that can be performed on this bench, including:

If you wish to perform any other processes on this bench, they must be approved by a tool engineer. Please create a helpdesk ticket for assistance.

Standard operating procedure

For a document version of the SOP, see below Widget text will go here.

Checkout procedure

  1. Take the General Wet Bench Training, if you haven't already.
  2. Read through this page and the Standard Operating Procedure above.
  3. Practice with your mentor or another authorized user until you are comfortable with tool operation.
  4. Fill out Process Information Form. You will need to fill this out for each bench you plan on using.
  5. Complete the 1440 Acid Bench quiz.
  6. Open a helpdesk ticket and request a checkout.
  7. If you pass the quiz the tool engineer will authorize you on the tool. If not you will be contacted to repeat.

Maintenance

User Allowed

  • If you break a nitrogen gun or a DI water gun, go in the back service aisle to turn off the inlet to the bench
  • Contact staff via Helpdesk system