Difference between revisions of "Acid Bench 73"
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|sop = [https://docs.google.com/document/d/1AduVT6p3tAV6EG-5MHiml61evDzBGSkPUws4AL0k1xw/preview SOP] | |sop = [https://docs.google.com/document/d/1AduVT6p3tAV6EG-5MHiml61evDzBGSkPUws4AL0k1xw/preview SOP] | ||
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|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]] | |maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]] | ||
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Acid Bench 73 is a wet bench used for working with [[:Category:Acid|acids]], mostly for [[Wet etching|etching]] and [[cleaning]] of samples that have had metals and/or polymers on them. It is considered a [[Metals]] class tool, so wafers with metal are allowed in the bench. It is intended for use with mixed materials and all substrate sizes up to 6 inches with the main focus being on piece parts. | Acid Bench 73 is a wet bench used for working with [[:Category:Acid|acids]], mostly for [[Wet etching|etching]] and [[cleaning]] of samples that have had metals and/or polymers on them. It is considered a [[Metals]] class tool, so wafers with metal are allowed in the bench. It is intended for use with mixed materials and all substrate sizes up to 6 inches with the main focus being on piece parts. | ||
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* Automated Bottle Wash | * Automated Bottle Wash | ||
| − | ==System | + | ==System overview== |
| − | ===Chemicals | + | ===Chemicals allowed=== |
* [[Acetic Acid|Acetic Acid (C<sub>2</sub>H<sub>4</sub>O<sub>2</sub>)]] | * [[Acetic Acid|Acetic Acid (C<sub>2</sub>H<sub>4</sub>O<sub>2</sub>)]] | ||
* [[Aluminum Etch|Aluminum Etch]] | * [[Aluminum Etch|Aluminum Etch]] | ||
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* [[Sulfuric acid|Sulfuric acid (H<sub>2</sub>SO<sub>4</sub>)]] | * [[Sulfuric acid|Sulfuric acid (H<sub>2</sub>SO<sub>4</sub>)]] | ||
| − | ===Hardware | + | ===Hardware details=== |
* Feedback control hot plate | * Feedback control hot plate | ||
* [[Quick dump rinse]] (QDR)/[[Cascade tank]] | * [[Quick dump rinse]] (QDR)/[[Cascade tank]] | ||
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**Solutions which contains toxic materials that cannot be removed by neutralization (such as gold and chromium etch) should not be aspirated or disposed of down the drain. | **Solutions which contains toxic materials that cannot be removed by neutralization (such as gold and chromium etch) should not be aspirated or disposed of down the drain. | ||
| − | ===Substrate | + | ===Substrate requirements=== |
* Piece Part to 6 inch wafers | * Piece Part to 6 inch wafers | ||
* Open to all approved substrates/materials | * Open to all approved substrates/materials | ||
** Some materials may require the use of private beakers | ** Some materials may require the use of private beakers | ||
| − | ===Material | + | ===Material restrictions=== |
{{material restrictions}} | {{material restrictions}} | ||
| − | ==Supported | + | ==Supported processes== |
<!-- | <!-- | ||
There are several processes for this tool supported by the LNF, which are described in more detail on the [[/Acid 73 Processes/]] page. | There are several processes for this tool supported by the LNF, which are described in more detail on the [[/Acid 73 Processes/]] page. | ||
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--> | --> | ||
| − | ==Standard | + | ==Standard operating procedure== |
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| − | ==Checkout | + | ==Checkout procedure== |
<!-- Describe the checkout procedure for the tool. For example: --> | <!-- Describe the checkout procedure for the tool. For example: --> | ||
Checkout on Acid Bench 73 also includes checkout [[Acid Bench 72]], and [[Acid Bench 82]]. Please be prepared for this when you reach steps 5 and 6. | Checkout on Acid Bench 73 also includes checkout [[Acid Bench 72]], and [[Acid Bench 82]]. Please be prepared for this when you reach steps 5 and 6. | ||
Revision as of 11:13, 24 August 2015
| Acid Bench 73 | |
|---|---|
 | |
| Equipment Details | |
| Technology | Wet bench |
| Materials Restriction | Metals |
| Chemicals Used | Sulfuric acid (H2SO4) |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | SOP |
| Maintenance | Maintenance |
Acid Bench 73 is a wet bench used for working with acids, mostly for etching and cleaning of samples that have had metals and/or polymers on them. It is considered a Metals class tool, so wafers with metal are allowed in the bench. It is intended for use with mixed materials and all substrate sizes up to 6 inches with the main focus being on piece parts.
Contents
Announcements
- Update this with announcements as necessary
Capabilities
Acid Bench 73 is for wet processing of with piece parts, 4, and 6 inch samples of mixed materials. This includes III-V and II-VI materials, samples with polymers, and irregularly shaped samples.
- Feedback controlled hotplate
- Rinse tank can be run as either a Quick dump rinse (QDR) or Overflow tank.
- Sink with goose neck
- Automated Bottle Wash
System overview
Chemicals allowed
- Acetic Acid (C2H4O2)
- Aluminum Etch
- Buffered HF (BHF)
- Hydrofluoric acid (HF)
- Chromium Etch
- Hydrochloric acid (HCl)
- Hydrogen peroxide (H2O2)
- Gold Etch
- Nanostrip
- Nitric acid (HNO3)
- Phosphoric Acid (H3O4P)
- Sulfuric acid (H2SO4)
Hardware details
- Feedback control hot plate
- Quick dump rinse (QDR)/Cascade tank
- Automatic Bottle Wash
- Sink with goose neck
- Open deck space
Safety
Proper PPE for this bench are apron, face shield, trionic gloves and safety glasses
 Warning: | You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab. |
Working with chemicals can be very dangerous. Chemicals used at this bench are some of the most hazardous in the lab. To minimize the chance of accident, make sure you always:
- Wear personal protective equipment. Required PPE at this bench is an apron, face shield, and Trionic gloves.
- Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
- Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
- Do not use this bench without proper training.
- Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers.
- No solvents can be used or disposed of here.
- Solutions which contains toxic materials that cannot be removed by neutralization (such as gold and chromium etch) should not be aspirated or disposed of down the drain.
Substrate requirements
- Piece Part to 6 inch wafers
- Open to all approved substrates/materials
- Some materials may require the use of private beakers
Material restrictions
The Acid Bench 73 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.
Approved materials
Supported processes
There are a variety of chemical processes that can be performed on this bench, including:
If you wish to perform any other processes on this bench, they must be approved by a tool engineer. Please create a helpdesk ticket for assistance.
Standard operating procedure
Widget text will go here.
Checkout procedure
Checkout on Acid Bench 73 also includes checkout Acid Bench 72, and Acid Bench 82. Please be prepared for this when you reach steps 5 and 6.
- Take the General Wet Bench Training, if you haven't already.
- Read through this page and the Standard Operating Procedure above.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Open a helpdesk ticket and request a checkout.
- A tool engineer will schedule a time for checkout.
- Complete the 1440 Acid Bench quiz.
- If you pass the quiz the tool engineer will authorize you on the tool. If not you will be contacted to repeat.
Maintenance
There are no staff maintained processes or tanks at this bench.
