Acid Bench 73

Acid Bench 73
Equipment Details
Technology	Wet Bench
Materials Restriction	Metals
Chemicals Used	Acids
Equipment Manual
Overview	System Overview
Operating Procedure	SOP
Supported Processes	Supported Processes
User Processes	User Processes
Maintenance	Maintenance

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This wet bench is used for working with acids, mostly for etching and cleaning samples that have had metals on them. It is considered a general use bench, so wafers with metal are allowed in the bench. It is intended for use with mixed materials and all substrate sizes up to 6 inches with the main focus being on piece parts.

Announcements

• Update this with announcements as necessary

Capabilities

• The Acid Bench 73 is for wet processing of with piece parts, 4, and 6 inch samples of mixed materials. This includes III-V and II-VI materials, samples with polymers, and irregularly shaped samples.
• Wafers that are going into furnaces or other CMOS-clean tools should not be processed in Acid Bench 73.

System Overview

Hardware Details

• Feedback control hot plate
• QDR/Cascade tank
• Bottle wash
• Sink with goose neck
• Open deck space

Safety

Working with chemicals can be very dangerous. Chemicals used at this bench are some of the most hazardous in the lab. To minimize the chance of accident, make sure you always:

• Wear personal protective equipment. Required PPE at this bench is an apron, face shield, and Trionic gloves.
• Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
• Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
• Only process 4” and 6” wafers.
• Do not use this bench without proper training.

• Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers.
  • No solvents can be used or disposed of here.
  • Solutions which contains toxic materials that cannot be removed by neutralization (such as gold and chromium etch) should not be aspirated or disposed of down the drain.

Substrate Requirements

• Piece Part to 6 inch wafers
• Open to all approved substrates/materials
  • Some materials may require the use of private beakers

Material Restrictions

The Acid Bench 73 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.

Approved materials

Supported Processes

There are several processes for this tool supported by the LNF, which are described in more detail on the Processes page.

In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on Acid Bench 73 User Processes. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.

Standard Operating Procedure

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Checkout Procedure

Checkout on Acid Bench 73 also includes checkout Acid Bench 72, and Acid Bench 82. Please be prepared for this when you reach steps 5 and 6.

1. Take the General Wet Bench Training, if you haven't already.
2. Read through this page and the Standard Operating Procedure above.
3. Practice with your mentor or another authorized user until you are comfortable with tool operation.
4. Open a Helpdesk ticket and request a checkout.
5. A tool engineer will schedule a time for checkout.
6. Complete the 1440 Acid Bench quiz.
7. If you pass the quiz the tool engineer will authorize you on the tool. If not you will be contacted to repeat.

Maintenance

There are no staff maintained processes or tanks at this bench.