Difference between revisions of "Aluminum"
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*[[Acid Bench 80]] - Beaker | *[[Acid Bench 80]] - Beaker | ||
*[[LAM 9400]] | *[[LAM 9400]] | ||
| − | + | ==Processes== | |
| − | ==Depositoin Processes== | + | ===Depositoin Processes=== |
*[[Electron_beam_evaporation|E-beam evaporation]] | *[[Electron_beam_evaporation|E-beam evaporation]] | ||
*[[Sputter_deposition|Sputter deposition]] | *[[Sputter_deposition|Sputter deposition]] | ||
| − | ==Etch Processes== | + | ===Etch Processes=== |
*[[Wet etching|Wet etching]] | *[[Wet etching|Wet etching]] | ||
**Wet etching can be used to etch aluminum using [[Aluminum Etch]] at [[Acid Bench 12]], [[Acid Bench 73]], and [[ Acid Bench 80]]. | **Wet etching can be used to etch aluminum using [[Aluminum Etch]] at [[Acid Bench 12]], [[Acid Bench 73]], and [[ Acid Bench 80]]. | ||
Revision as of 16:46, 6 April 2020
 Warning: | This page has not been released yet. |
| Aluminum | |
|---|---|
| Material Details | |
| Material Restriction | Undefined |
Aluminum is a metal that is a silvery-white, soft, non-magnetic and ductile in the boron group.
Contents
Applications
- Discuss common uses/applications for this material. Why this materials is used in the LNF?
Processing Equipment
Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.
Deposition Equipment
Etching Equipment
- Acid Bench 12 - maintained tank
- Acid Bench 73 - Beaker
- Acid Bench 80 - Beaker
- LAM 9400
Processes
Depositoin Processes
Etch Processes
- Wet etching
- Wet etching can be used to etch aluminum using Aluminum Etch at Acid Bench 12, Acid Bench 73, and Acid Bench 80.
- Reactive ion etching
References
- Etch rates for micromachining processing https://ieeexplore.ieee.org/abstract/document/546406
- Etch rates for micromachining processing-Part II https://ieeexplore.ieee.org/abstract/document/1257354
