Difference between revisions of "Argon"

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(Created page with "<!-- Make sure to add any other relevant categories --> Category:Chemicals {{warning|This page has not been released yet.}} Argon is a noble gas used in :Category:RIE|r...")
 
 
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[[Category:Chemicals]]
 
[[Category:Chemicals]]
 
{{warning|This page has not been released yet.}}
 
{{warning|This page has not been released yet.}}
 
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Argon is a noble gas used in [[:Category:RIE|reactive ion etching]].  It is non-reactive and has a high mass which generally causes a more physical etch. It is also used in ???
Argon is a noble gas used in [[:Category:RIE|reactive ion etching]] and xyz.
 
  
 
==Equipment==
 
==Equipment==
*[[STS_Pegasus_4]]
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*[[STS Pegasus 4]]
*[[STS_Pegasus_6]]
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*[[STS Pegasus 6]]
*[[STS_Glass_Etcher]]
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*[[STS Glass Etcher]]
*[[LAM_9400]]
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*[[P5000 RIE]]
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*[[LAM 9400]]
 
*[[Plasmatherm 790]]
 
*[[Plasmatherm 790]]
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*[[YES Plasma Stripper]]
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==Safety Data Sheet==
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* [http://www.praxair.com/~/media/North%20America/US/Documents/SDS/Argon%20Gas%20Ar%20Safety%20Data%20Sheet%20SDS%20P4563.pdf SDS]
  
 
==References==
 
==References==
 
* [http://en.wikipedia.org/wiki/Argon Wikipedia page]
 
* [http://en.wikipedia.org/wiki/Argon Wikipedia page]
* [http://www.praxair.com/~/media/North%20America/US/Documents/SDS/Argon%20Gas%20Ar%20Safety%20Data%20Sheet%20SDS%20P4563.pdf SDS]
 

Latest revision as of 14:26, 20 April 2015

Warning Warning: This page has not been released yet.

Argon is a noble gas used in reactive ion etching. It is non-reactive and has a high mass which generally causes a more physical etch. It is also used in ???

Equipment

Safety Data Sheet

References