View source for CEE 100CB photoresist spinner

{{#vardefine:toolid|53101}} {{#vardefine:technology|Lithography}} {{#vardefine:restriction|4}}
{{infobox equipment
|caption = 
|materials = [[Photoresist]]
|mask =
|size = pieces up to 6" wafers
|chemicals = [[Acetone]], [[IPA]]
|gases = 
|overview = [https://docs.google.com/a/lnf.umich.edu/document/d/1ooO1VwG9OBVY1i6IKF5UI8pf1sPTK09_Rw7BKxS8rr4/preview System Overview]
|sop = [https://drive.google.com/file/d/14W8Sd6mDoN3QSy0CS6_P53OVr2R54U-m/view?usp=sharing SOP]
|processes = [https://docs.google.com/a/lnf.umich.edu/document/d/1Pa-9pSY5f_sTXxr7zyWsekT-IF4lAf8mW3VI5YjTvZg/preview Supported Processes]
|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]]
}}The CEE 100CB Spinner is a fully programmable, manual dispense, [[photoresist]] spinner located in the main cleanroom at the LNF. It can accept pieces, 4" and 6" wafers.  It is located in 1440C.

==Announcements==
The CEE 100CB is down from the continuing computer issues on the tool. We are looking into replacing the tool, and it will be unavailable until further notice. All photoresist spinning will have to be at the CEE 200X. If you are spinning LOR, KMPR, or AZ 9260 in the next couple of weeks, make a ticket and we will discuss the procedure with you. If you do not have access to the CEE 200X spinners, make a ticket and we will work to get you access as soon as I can.

If you have any questions or concerns please make a ticket, and we will be happy to help you. We apologize for the inconvenience, and thank you for your patience.

==Capabilities==

*Available Photoresists
**[[SPR 220]] (3.0)
**SPR 220 (7.0)
**S1813
*Allowed Photoresists
**[[KMPR]]
**[[AZ 12XT]]
**[[LOR]]

{{note|[[PMMA]] and other e-beam resists should be processed in [[Photoresist Bench 31]] in 1480A|reminder}}
{{note|Any other non standard photoresist must have direct approval of tool owner|reminder}}
{{note|[[SU-8]] may only be processed in the [[ROBIN]] lab|error}}

==System Overview==
===Hardware Details===

*Up to 5K rpm spin rates
*Hot plate maintained at 115°C

===Substrate Requirements===

*From 10x10 mm pieces up to 150 mm (6 inch) wafers
*No substrate material requirements
*Available Chucks
**6" Chuck (Ø 3.75")
**4" Chuck (Ø 2.25")
**Large Piece Chuck (Ø 0.75")
**Small Piece Chuck (Ø 0.25" - chuck ; Ø 0.375" - O-ring)

{{note|Please choose a chuck sized appropriately for your sample.  Your sample must fully cover the top surface of the chuck to prevent photoresist from being sucked into the vacuum hole.  The tools may be damaged if photoresist or solvent goes into the vacuum hole in the spindle.  Incorrect chuck use will result in loss of tool access.|reminder}}

<gallery mode="packed-hover" heights="200px">
File:CEE Correct Sample.jpg|Correct chuck for sample
File:CEE Incorrect Sample.jpg|Incorrect chuck for sample - a smaller chuck should be used
</gallery>

===Material Restrictions===
{{material restrictions}}

==Supported Processes== 
There are 10 recipe slots in the software, used as follows:

*8 fixed spin recipes (recipes 1-8), 1 stripping recipe (recipe 9), 1 manual recipe (recipe 0)
**4 recipes (1000-4000 rpm) for thin resists (e.g. SPR 220 3.0)
**4 recipes (1000-4000 rpm) for thick resists (e.g. KMPR 1010)
*Only recipe 0 is allowed to be changed, instructions on how to do so can be found in the SOP


More information on the recipe details can be found in the [https://docs.google.com/document/d/1Pa-9pSY5f_sTXxr7zyWsekT-IF4lAf8mW3VI5YjTvZg/preview standard processes] document. For more information on photoresist spinning and recommended lithoraphy processes, please read the [[Lithography]] page. For information on a specific [[photoresist]], please check the datasheet.

==Standard Operating Procedure==

*[https://drive.google.com/file/d/14W8Sd6mDoN3QSy0CS6_P53OVr2R54U-m/view?usp=sharing Standard Operating Procedure]
*[https://drive.google.com/open?id=1PUpEVkKgJbtwSQDtSDjwGgrWNXCAs1Pj Custom Recipe]
*[https://drive.google.com/file/d/18O6zX9TMgqkkg4lfS_FmM48q7cOTTCAE/view?usp=sharing Troubleshooting]

==Checkout procedure==

# Complete a [[Lithography training session]]. If you have already completed this for another tool, you do not need to complete it again.
# Practice on the tool with your mentor.
# Read through the User Manual above.
# Accurately complete the [https://forms.gle/BhaLUKNRuAkZygBH9 checkout quiz]. You may retake as necessary until all answers are correct.
# Schedule a time for a checkout:
## Find an available time for checkout [https://calendly.com/lnf-lithography/cee-spinners here].
## Verify that the tool is available in the [https://ssel-sched.eecs.umich.edu/sselscheduler/ResourceDayWeek.aspx?Path=0-0-0-{{#var:toolid}} LNF Online Services] at the time you are requesting.
## After confirmation that the event is scheduled in Calendly, invite the staff member assigned to your event to a Staff Support reservation at that time.
# Create a [http://ssel-sched.eecs.umich.edu/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:{{#var:toolid}} helpdesk ticket] for final confirmation of your checkout appointment.
# Authorization will be provided pending demonstration of proper tool use in the presence of a tool engineer.

==Maintenance== 
The bowl, chucks, and hotplate are cleaned each week during lab clean.  The protective lining in the bowl is replaced weekly as necessary.

===User authorized maintenance===
In the event of a power bump, users may run the [https://docs.google.com/document/d/1oTizZVl5GZAenTRnB9KMECxPpM76_l0Ikm48JP01g6c/preview startup/shutdown procedure].