Difference between revisions of "CEE 100CB photoresist spinner"

From LNF Wiki
Jump to navigation Jump to search
Line 23: Line 23:
 
** [[AZ 5214]]
 
** [[AZ 5214]]
 
** [[AZ 9260]]
 
** [[AZ 9260]]
 +
** [[LOR]]
  
 
{{note|[[PMMA]] and other e-beam resists should be processed in [[Photoresist Bench 31]] in 1480A|reminder}}
 
{{note|[[PMMA]] and other e-beam resists should be processed in [[Photoresist Bench 31]] in 1480A|reminder}}

Revision as of 17:35, 8 May 2017

CEE 100CB photoresist spinner
53101.jpg
Equipment Details
Technology Lithography
Materials Restriction Metals
Material Processed Photoresist
Sample Size pieces up to 6" wafers
Chemicals Used Acetone, IPA
Equipment Manual
Overview System Overview[IPA]]
Operating Procedure SOP
Supported Processes Supported Processes[IPA]]
Maintenance Maintenance

The CEE 100CB Spinner is a fully programmable, manual dispense, photoresist spinner located in the main cleanroom at the LNF. It can accept pieces, 4" and 6" wafers. It is located in 1440C.

Announcements

None at this time.

Capabilities

PMMA and other e-beam resists should be processed in Photoresist Bench 31 in 1480A
Any other non standard photoresist must have direct approval of tool owner
SU-8 may only be processed in the ROBIN lab

System Overview

Hardware Details

  • Up to 5K rpm spin rates
  • Hot plate maintained at 115°C

Substrate Requirements

  • 1x1 cm pieces up to 6" wafers
  • No substrate material requirements
  • Available Chucks
    • 6" Chuck (Ø 3.75")
    • 4" Chuck (Ø 2.25")
    • Large Piece Chuck (Ø 0.75")
    • Small Piece Chuck (Ø 0.25" - chuck ; Ø 0.375" - O-ring)
Please choose a chuck sized appropriately for your sample. Your sample must fully cover the top surface of the chuck to prevent photoresist from being sucked into the vacuum hole. The tools may be damaged if photoresist or solvent goes into the vacuum hole in the spindle. Incorrect chuck use will result in loss of tool access.

Material Restrictions

The CEE 100CB photoresist spinner is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported Processes

There are 10 recipe slots in the software, used as follows:

  • 8 fixed spin recipes, 1 stripping recipe, 1 manual recipe
    • 4 recipes (1000-4000 rpm) for thin resists (e.g. SPR 220 3.0)
    • 4 recipes (1000-4000 rpm) for thick resists (e.g. KMPR 1010)

More information on the recipe details can be found in the standard processes document. For more information on photoresist spinning and recommended lithoraphy processes, please read the Lithography page. For information on a specific photoresist, please check the datasheet.

Standard Operating Procedure

Widget text will go here.

For information on manually dispensing photoresist, please review the EFD DispensGun manual.

Checkout procedure

  1. Complete a Lithography training session. If you have already completed this for another tool, you do not need to complete it again.
  2. Read this page and the SOP.
  3. Take the quiz found here.
  4. Create a helpdesk ticket requesting checkout.

A staff member will verify the correctness of your quiz response and schedule a brief checkout session before authorizing you.

Maintenance

The bowl, chucks, and hotplate are cleaned each week during lab clean. The protective lining in the bowl is replaced weekly as necessary.

User authorized maintenance

In the event of a power bump, users may run the startup/shutdown procedure.