Doping diffusion

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Doping diffusion
Technology Details
Technology Thermal processing
Equipment List of doping diffusion equipment
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Doping diffusion is a process used to introduce impurities (phoshorous, boron) into silicon semiconductor wafers.

Equipment

Tempress S5T1 - Phosphorous Diffusion

The Tempress S5T1 furnace tube is a CMOS clean, modular, horizontal furnace tube that uses the diffusion process to deposit dope silicon wafers with phosphorous.

Tempress S5T3 - Boron Diffusion 4"

The Tempress S5T3 furnace tube is a CMOS clean, modular, horizontal furnace tube that uses the diffusion process to deposit dope silicon wafers with phosphorous.

Materials

  • Phosphorous (liquid source)
  • Boron (solid source)

Method of operation

Describe how the technology works.

Parameters

Parameter 1

Main article: Parameter 1

Applications

  • MEMS

Complete tool list

See also

Other related wiki pages

References


Further reading