|Equipment||List of doping diffusion equipment|
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Doping diffusion is a process used to introduce impurities (phoshorous, boron) into silicon semiconductor wafers.
Tempress S5T1 - Phosphorous Diffusion
The Tempress S5T1 furnace tube is a CMOS clean, modular, horizontal furnace tube that uses the diffusion process to deposit dope silicon wafers with phosphorous.
Tempress S5T3 - Boron Diffusion 4"
The Tempress S5T3 furnace tube is a CMOS clean, modular, horizontal furnace tube that uses the diffusion process to deposit dope silicon wafers with phosphorous.
- Phosphorous (liquid source)
- Boron (solid source)
Method of operation
Describe how the technology works.
Complete tool list
Other related wiki pages
- LNF Tech Talk for Doping diffusion is Coming Soon!
- Other stuff, e.g. technology workshop slides
- External links (can be in another section below, if appropriate)