Difference between revisions of "EVG 510"
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{{infobox equipment | {{infobox equipment | ||
|caption = | |caption = | ||
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|maintenance = [https://docs.google.com/document/d/1AJMewlQGrYUMI_lpq5ffChDiakoJaBTVrq7AXBCRJpQ/preview Maintenance] | |maintenance = [https://docs.google.com/document/d/1AJMewlQGrYUMI_lpq5ffChDiakoJaBTVrq7AXBCRJpQ/preview Maintenance] | ||
}} | }} | ||
+ | The [[{{PAGENAME}}]] is a [[Wafer bonding|wafer bonder]] capable of bonding pieces up to 150 mm wafers. It is primarily used for polymer bonding and wafer mounting with [[Waferbond|WaferBOND]], but can also be used for other other types of bonding. Generally the [[EVG 520IS]] should be used for non-polymer bonding since the chamber is less contaminated with as the chamber does not allow polymers making the tool cleaner. Also the [[CL200 Megasonic Cleaner]] can be used before bonding to reduce particulate. | ||
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==Announcements== | ==Announcements== | ||
− | * | + | ===Pressure Plate Schedule=== |
+ | Unless otherwise specified, the default pressure plate will be installed in the tool. For all other pressure plate change requests, please submit a helpdesk ticket at least 2 business days in advance. If there are existing reservations to use the scheduled plate, those will take precedence. | ||
+ | * Default: '''4" Ti''' | ||
+ | {{note|Users are not authorized to change pressure plates.|reminder}} | ||
==Capabilities== | ==Capabilities== | ||
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** Anodic | ** Anodic | ||
** Eutectic | ** Eutectic | ||
− | + | * Wafer mounting via [[Waferbond|WaferBOND]] | |
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− | * Wafer | ||
==System Overview== | ==System Overview== | ||
===Hardware Details=== | ===Hardware Details=== | ||
− | * Force | + | * Force |
− | * Vacuum | + | ** 0.1 to 10 kN |
− | * Temperature | + | ** '''Maximum pressure: 3.8 MPa''' (dependent on hardware and bonding method) |
− | * Voltage | + | * Vacuum |
− | * | + | ** 1e-5 mBar |
+ | ** ACP 28G Backing pump with Turbo | ||
+ | * Temperature | ||
+ | ** 20°C to 550°C | ||
+ | ** 45°C/min heating rate | ||
+ | ** Passive cooling (1°C/min) | ||
+ | * Voltage | ||
+ | ** ± 2000 V | ||
+ | **Up to 50 mA | ||
===Substrate Requirements=== | ===Substrate Requirements=== | ||
* Pieces, 100 mm, 150 mm | * Pieces, 100 mm, 150 mm | ||
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===Material Restrictions=== | ===Material Restrictions=== | ||
+ | {{note|The approved materials listed for the {{PAGENAME}} are restricted to those that can come into surface with the tooling. There are several exceptions that are allowed within the bond interface, depending on the type of bond used. Some of these can be found in the [[#supported processes]] section. For any other materials, please create a helpdesk ticket. }} | ||
{{material restrictions}} | {{material restrictions}} | ||
==Supported Processes== | ==Supported Processes== | ||
<!-- We recommend creating a subpage detailing the supported processes for the tool, which will be generated if you leave the link below. Alternatively, you may include the information on this page. In that case, the Supported Processes document from the equipment manual can be included here, using {{#widget:GoogleDoc|key=googledocid}} --> | <!-- We recommend creating a subpage detailing the supported processes for the tool, which will be generated if you leave the link below. Alternatively, you may include the information on this page. In that case, the Supported Processes document from the equipment manual can be included here, using {{#widget:GoogleDoc|key=googledocid}} --> | ||
+ | There are currently no characterized processes for the tool. | ||
− | + | {{:{{PAGENAME}}/Processes}} | |
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==Standard Operating Procedure== | ==Standard Operating Procedure== | ||
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<!-- Describe the checkout procedure for the tool. For example: --> | <!-- Describe the checkout procedure for the tool. For example: --> | ||
# Read through this page and the Standard Operating Procedure above. | # Read through this page and the Standard Operating Procedure above. | ||
− | |||
# Create a [http://ssel-sched.eecs.umich.edu/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:{{#var:toolid}} Helpdesk Ticket] requesting training. | # Create a [http://ssel-sched.eecs.umich.edu/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:{{#var:toolid}} Helpdesk Ticket] requesting training. | ||
# A tool engineer will schedule a time for initial training. | # A tool engineer will schedule a time for initial training. | ||
# Practice with your mentor or another authorized user until you are comfortable with tool operation. | # Practice with your mentor or another authorized user until you are comfortable with tool operation. | ||
− | # Complete the SOP quiz [ | + | # Complete the SOP quiz [https://docs.google.com/a/lnf.umich.edu/forms/d/1raB62V5H1_9IGCpoodSNi_aCtRyay_-So2Y2hUQtKlc/viewform here]. |
# Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool. | # Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool. | ||
==Maintenance== | ==Maintenance== | ||
<!-- Describe standard maintenance/qualification tests here --> | <!-- Describe standard maintenance/qualification tests here --> | ||
− | Once a week the chucks are cleaned and inspected for damage. A monitor run is performed every | + | {{disputed-section}} |
+ | Once a week the chucks are cleaned and inspected for damage. A monitor run is performed every other month on a 150 mm wafer to ensure that the tool is in good operating condition. |
Revision as of 18:21, 25 March 2021
EVG 510 | |
---|---|
Equipment Details | |
Technology | Wafer bonding |
Materials Restriction | Metals |
Material Processed | Si, Glass |
Sample Size | pieces, 100 mm, 150 mm |
Equipment Manual | |
Overview | System Overview |
Operating Procedure | SOP |
Supported Processes | Processes |
Maintenance | Maintenance |
The EVG 510 is a wafer bonder capable of bonding pieces up to 150 mm wafers. It is primarily used for polymer bonding and wafer mounting with WaferBOND, but can also be used for other other types of bonding. Generally the EVG 520IS should be used for non-polymer bonding since the chamber is less contaminated with as the chamber does not allow polymers making the tool cleaner. Also the CL200 Megasonic Cleaner can be used before bonding to reduce particulate.
Contents
Announcements
Pressure Plate Schedule
Unless otherwise specified, the default pressure plate will be installed in the tool. For all other pressure plate change requests, please submit a helpdesk ticket at least 2 business days in advance. If there are existing reservations to use the scheduled plate, those will take precedence.
- Default: 4" Ti
Capabilities
- Bonding
- Polymer
- Anodic
- Eutectic
- Wafer mounting via WaferBOND
System Overview
Hardware Details
- Force
- 0.1 to 10 kN
- Maximum pressure: 3.8 MPa (dependent on hardware and bonding method)
- Vacuum
- 1e-5 mBar
- ACP 28G Backing pump with Turbo
- Temperature
- 20°C to 550°C
- 45°C/min heating rate
- Passive cooling (1°C/min)
- Voltage
- ± 2000 V
- Up to 50 mA
Substrate Requirements
- Pieces, 100 mm, 150 mm
Material Restrictions
The EVG 510 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.
Supported Processes
There are currently no characterized processes for the tool.
Maximum force
Bonding processes are characterized by a required pressure (force per area) in order to achieve bonding. The tool recipe specifies a force (in Newtons). This value should be scaled depending on the sample size to achieve the desired pressure. In addition, there is a maximum pressure that may be applied without damaging the equipment, which is dependent on the tooling material and whether the temperature is constant or varying while applying force.
The maximum pressure for the tooling available is shown in the following table. To calculate the force (in N), multiply the pressure (in MPa) by the sample area (in mm2).
Pressure Disk Material | Pressure (MPa) | |
---|---|---|
Steady state | While heating | |
Ti | 3.8 | 0.5 |
Quartz | 0.6 | 0.2 |
Several common sample sizes are shown below. Note that small pieces cannot be used with the quartz plate, because they are below the minimum pressure that the tool can apply (100 N).
Pressure Disk Material | Force (kN) | |||||||
---|---|---|---|---|---|---|---|---|
150 mm wafer | 100 mm wafer | 50 mm wafer | 10x10 mm piece | |||||
Steady state | While heating | Steady state | While heating | Steady state | While heating | Steady state | While heating | |
Ti | 10 | 8 | 10 | 4 | 7.5 | 1 | 0.4 | N/A |
Quartz | 10 | 5 | 5 | 2 | 1.25 | 0.5 | N/A | N/A |
Standard Operating Procedure
Widget text will go here.
Checkout Procedure
- Read through this page and the Standard Operating Procedure above.
- Create a Helpdesk Ticket requesting training.
- A tool engineer will schedule a time for initial training.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Complete the SOP quiz here.
- Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.
Maintenance
This section's factual accuracy is disputed. |
Once a week the chucks are cleaned and inspected for damage. A monitor run is performed every other month on a 150 mm wafer to ensure that the tool is in good operating condition.