Difference between revisions of "EVG 510"
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|materials = Si, Glass | |materials = Si, Glass | ||
|mask = | |mask = | ||
| − | |size = 100 mm, 150 mm | + | |size = pieces, 100 mm, 150 mm |
|chemicals = | |chemicals = | ||
|gases = | |gases = | ||
| − | |overview = [ | + | |overview = [https://docs.google.com/document/d/1B_AZB10sm_9I8wj2WtcE_DBPSEyqrAvhozww7Uku_3Y/preview System Overview] |
| − | |sop = [https:// | + | |sop = [https://docs.google.com/document/d/1qYImes52gkxTfh-EgEKeHyo5vplXYe9jR1R_GwvQVgw/preview SOP] |
|processes = [[{{PAGENAME}}/Processes|Supported Processes]] | |processes = [[{{PAGENAME}}/Processes|Supported Processes]] | ||
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|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]] | |maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]] | ||
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==Capabilities== | ==Capabilities== | ||
<!--A more general description of what the tool is capable of doing.--> | <!--A more general description of what the tool is capable of doing.--> | ||
| − | * | + | *Force |
| − | * | + | *Vacuum |
| − | * | + | *Heat |
| − | * Thickness | + | *Voltage |
| + | *Thickness | ||
==System Overview== | ==System Overview== | ||
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===Substrate Requirements=== | ===Substrate Requirements=== | ||
| − | * | + | * Pieces, 100 mm, 150 mm |
* Wafer type | * Wafer type | ||
| − | + | * Wafer thickness ? | |
| − | * Wafer thickness | ||
===Material Restrictions=== | ===Material Restrictions=== | ||
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==Standard Operating Procedure== | ==Standard Operating Procedure== | ||
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==Checkout Procedure== | ==Checkout Procedure== | ||
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Revision as of 11:49, 27 July 2015
| EVG 510 | |
|---|---|
 | |
| Equipment Details | |
| Technology | Wafer Bonding |
| Materials Restriction | Metals |
| Material Processed | Si, Glass |
| Sample Size | pieces, 100 mm, 150 mm |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | SOP |
| Supported Processes | Supported Processes |
| Maintenance | Maintenance |
 Warning: | This page has not been released yet. |
Contents
Announcements
- Update this with announcements as necessary
Capabilities
- Force
- Vacuum
- Heat
- Voltage
- Thickness
System Overview
Hardware Details
- Gases
- Pressure
- Chuck
- Chamber
- RF / Power Specs
- Chemicals
Substrate Requirements
- Pieces, 100 mm, 150 mm
- Wafer type
- Wafer thickness ?
Material Restrictions
The EVG 510 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.
Approved materials
Supported Processes
There are several processes for this tool supported by the LNF, which are described in more detail on the Processes page.
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on EVG 510 User Processes. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
Standard Operating Procedure
Widget text will go here.
Checkout Procedure
- Read through this page and the Standard Operating Procedure above.
- Complete the training request form here.
- Create a Helpdesk Ticket requesting training.
- A tool engineer will schedule a time for initial training.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Complete the SOP quiz here.
- Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.
Maintenance
}}
