File:350nm lines low reflection.jpg

From LNF Wiki
Revision as of 20:13, 11 September 2019 by Wrightsh (talk | contribs) (Stepper exposure matrix 350nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

Original file ‎(6,804 × 851 pixels, file size: 371 KB, MIME type: image/jpeg)

Stepper exposure matrix 350nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly).

100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop

File history

Click on a date/time to view the file as it appeared at that time.

Date/TimeThumbnailDimensionsUserComment
current11:59, 12 September 2019Thumbnail for version as of 11:59, 12 September 20196,804 × 851 (371 KB)Wrightsh (talk | contribs)Stepper exposure matrix 350nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS deve...
  • You cannot overwrite this file.

The following page uses this file:

Metadata

This file contains additional information, probably added from the digital camera or scanner used to create or digitize it.

If the file has been modified from its original state, some details may not fully reflect the modified file.

Retrieved from "https://lnf-wiki.eecs.umich.edu/wiki/index.php?title=File:350nm_lines_low_reflection.jpg&oldid=16764"