Difference between revisions of "File:400nm gratings low reflection.jpg"

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(Stepper exposure matrix 400nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25...)
 
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Latest revision as of 11:55, 12 September 2019

Stepper exposure matrix 400nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS dev.

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current11:55, 12 September 2019Thumbnail for version as of 11:55, 12 September 20197,654 × 852 (444 KB)Wrightsh (talk | contribs)Stepper exposure matrix 400nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25...
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