File:500nm lines low reflection.jpg
Revision as of 20:19, 11 September 2019 by Wrightsh (talk | contribs) (Wrightsh uploaded a new version of File:500nm lines low reflection.jpg)
Size of this preview: 799 × 80 pixels. Other resolutions: 320 × 32 pixels | 8,504 × 852 pixels.
Original file (8,504 × 852 pixels, file size: 491 KB, MIME type: image/jpeg)
Stepper exposure matrix 500nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly).
100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
File history
Click on a date/time to view the file as it appeared at that time.
| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 12:00, 12 September 2019 | | 8,504 × 852 (491 KB) | Wrightsh (talk | contribs) | Stepper exposure matrix 500nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS deve... |
- You cannot overwrite this file.
File usage
The following page uses this file:
