Difference between revisions of "Gold"

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===Etch Processes===
 
===Etch Processes===
 
====[[Wet etching]]====
 
====[[Wet etching]]====
Wet etching is done by using Transene [[Gold Etch]] 8111.  Gold etchant 8111 is a cyanide free based etchant that provides strong definition with minimal undercutting.  Gold etchant is potassium iodide and iodine based.
+
Wet etching is done by using Transene [[Gold Etch]] 8111.  Gold etchant 8111 is a cyanide free based etchant that provides strong definition with minimal undercutting.  Gold etchant is potassium iodide and iodine based. You can get a good estimate of etch gold etch rates through other chemicals from ["Etch rates for micromachining processing"] and ["Etch rates for micromachining processing-Part II"]
  
 
==References==
 
==References==
 
*[http://en.wikipedia.org/wiki/Gold Wikipedia Gold]
 
*[http://en.wikipedia.org/wiki/Gold Wikipedia Gold]

Revision as of 19:54, 31 March 2020

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Gold
Material Details
Material Restriction Metals



Gold is generally used for conductive layers and occasionally in bonding applications. Due to its high mobility it is not allowed in most semiconductor equipment.

Applications

Discuss common uses/applications for this material.

Processing Tools

Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.

Equipment

  • List of equipment for processing this material

Processes

Deposition

Evaporated Gold

Plated Gold

Sputtered Gold

Etch Processes

Wet etching

Wet etching is done by using Transene Gold Etch 8111. Gold etchant 8111 is a cyanide free based etchant that provides strong definition with minimal undercutting. Gold etchant is potassium iodide and iodine based. You can get a good estimate of etch gold etch rates through other chemicals from ["Etch rates for micromachining processing"] and ["Etch rates for micromachining processing-Part II"]

References