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Gold Etchant GE-8111 is designed for etching thin gold films. It is a potassium iodide and iodine (K/I2) chemistry. GE-8111 is compatible with both positive and negative resists. GE-8111 is designed to be used at room temperature in a well ventilated area. GE-8111 needs to be collected after use.

Contents

Processes

  • Published Etch Rate 20Å/sec
  • To minimize under cut use hard baked 1813

Process SOPs

  • There are currently no process SOPs defined for this chemical.

Equipment

GE-8111 can be used in the following Wet Benches:

Technical Data Sheet

Compatibility Chart

  • Al - etch
  • Al2O3 - slight
  • Au - etch
  • C - slight
  • Co - Slight
  • Cr - ok
  • Cu - corrode
  • Fe - ok
  • GaAs - etch
  • Mg - ok
  • MgO - ok
  • Nb - ok
  • Ni - ok
  • Pd - ok
  • Pt - ok
  • Ru - ok
  • Si - ok
  • Si3N4 - ~ 1Å/min
  • SiO2 - ok
  • Steel - ok
  • Ta/TaN - ok
  • Ti - ok
  • W - ok
  • ZnO - slight

Safety Data Sheet

  • There are currently no Safety Data Sheets (SDSes) for this chemical.

References

  • Other links that are useful