Gold Etch GE-8111
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Gold Etchant GE-8111 is designed for etching thin gold films. It is a potassium iodide and iodine (K/I2) chemistry. GE-8111 is compatible with both positive and negative resists. GE-8111 is designed to be used at room temperature in a well ventilated area. GE-8111 needs to be collected after use.
Contents
Processes
- Published Etch Rate 20Å/sec
- To minimize under cut use hard baked 1813
Process SOPs
- There are currently no process SOPs defined for this chemical.
Equipment
GE-8111 can be used in the following Wet Benches:
- Acid Bench 12 - large staff changed tank
- Acid Bench 73
- Acid Bench 82
- Acid Bench 92
Technical Data Sheet
- Al - etch
- Al2O3 - slight
- Au - etch
- C - slight
- Co - Slight
- Cr - ok
- Cu - corrode
- Fe - ok
- GaAs - etch
- Mg - ok
- MgO - ok
- Nb - ok
- Ni - ok
- Pd - ok
- Pt - ok
- Ru - ok
- Si - ok
- Si3N4 - ~ 1Å/min
- SiO2 - ok
- Steel - ok
- Ta/TaN - ok
- Ti - ok
- W - ok
- ZnO - slight
Safety Data Sheet
- There are currently no Safety Data Sheets (SDSes) for this chemical.
References
- Other links that are useful