Difference between revisions of "Hitachi SU8000 In-line FE-SEM"

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==Checkout Procedure==
 
==Checkout Procedure==
 
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# Read through this page and the Equipment Manual above.
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# Read through this page and the Equipment Manual above and the [https://www.dropbox.com/s/sx25bro4rxpi08y/2015-05%20SEM%20at%20LNF.pdf?dl=0 SEM tech talk slides].
 
# If your mentor is authorized on the system, practice the tool with them. Otherwise make a [http://ssel-sched.eecs.umich.edu/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:{{#var:toolid}} helpdesk ticket] to schedule an initial training.
 
# If your mentor is authorized on the system, practice the tool with them. Otherwise make a [http://ssel-sched.eecs.umich.edu/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:{{#var:toolid}} helpdesk ticket] to schedule an initial training.
 
# Schedule a time for a checkout:
 
# Schedule a time for a checkout:

Latest revision as of 12:38, 20 December 2021

Hitachi SU8000 In-line FE-SEM
85051.jpg
Equipment Details
Technology Metrology
Materials Restriction General
Sample Size Piece parts to upto 6" Wafers (No powders)
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Supported Processes
Maintenance Maintenance


The Hitachi SU8000 cold field emission Scanning Electron Microscope (FE-SEM) uses a focussed beam of high-energy electrons to generate a variety of signals at the surface of solid specimens. The signals that derive from the electron-sample interactions reveal information about the sample including external morphology (texture), chemical composition, crystalline structure and orientation of materials making up the sample. In most applications, data are collected over a selected area of the surface of the substrate and an image is generated that displays spatial variations in these properties. Areas ranging from a few mms to several 10s of nms in width can be imaged in a scanning mode using conventional SEM techniques (magnification ranging from 45X to 1,000,000X). The SEM is also capable of performing analyses of selected point locations on the sample, this approach is especially useful in qualitatively or semi-quantitatively determining chemical compositions (using EDS), crystalline structure, and crystal orientations (using BSD).

Announcements

  • Instrument is online and is available for use.

Capabilities

  • Secondary electron image resolution
    • 1 nm at Vacc = 15 KV and WD = 4 mm
    • 1.3 nm (landing voltage 1kV, WD=1.5 mm)
  • Magnification
    • Low mag mode - 45 to 2000X
    • High mag mode - 100 to 1,000,000X
  • Electrical image shift
    • ±12µm (WD=8 mm)
  • Stage traverse range 110mm × 110mm
  • SE-BSE signal mixing function

System Overview

Hardware Details

  • Electron Optics
    • Electron Gun - Cold Cathode Field Emission Source
    • Accelerating voltage - 0.5 KV to 30 KV
    • Landing voltage - 0.1 KV to 2.0 KV
    • Objective lens aperture - Objective aperture (Heating type), 4 openings, selectable from outside of vacuum
  • Specimen stage
    • Stage control - 5-axis motor drive
    • Transverse range - X=0 to 110 mm, Y=0 to 110 mm, R=360°; T=-5-70°, Z=1.5-40 mm
    • Maximum sample size - 150 mm
  • Detector
    • Secondary electron detector - Lower/Upper/Top; SE/BSE Signal Mixing Function (Upper detector)
    • Backscattered electron detector - Photodiode type backscattered electron detector
    • Other - Energy dispersive X-ray spectrometer

Substrate Requirements

  • Most solids are allowed
  • The tool is able to take small pieces to up to 6” wafers
  • Unbaked polymers/adhesives, liquids, oils and anything that will outgas under vacuum are prohibited
  • Samples likely to decrepitate at low pressure should not be put in the vacuum system of the tool
  • Powder samples are prohibited
  • Pieces must be stuck onto the appropriate diameter stub using either double sided Cu tape or high conductivity Ag paste only (all other mounting methods are prohibited).
If using Ag paste, ensure that the paste is completely dry before inserting sample. Failure to do this will cause the paste to out-gas and compromise the high vacuum in the main chamber

Material Restrictions

The Hitachi SU8000 In-line FE-SEM is designated as a General class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported Processes

There are no Standard Processes for the Hitachi SU8000 In-Line FE-SEM. However, having the right detector settings and probe current are extremely important in order to analyze your specimen. Please use the image below to choose which detector/combination of detectors to use for your specific application.

SU8000 Detectors.png

Secondary Electron detection (SED) is the most commonly used imaging mode. Please use the screenshot below to set the detectors to defaults, both in the Low Mag and High Mag mode, for secondary electron imaging.

SU8000 SED.jpg


Standard Operating Procedure

Widget text will go here.

Checkout Procedure

  1. Read through this page and the Equipment Manual above and the SEM tech talk slides.
  2. If your mentor is authorized on the system, practice the tool with them. Otherwise make a helpdesk ticket to schedule an initial training.
  3. Schedule a time for a checkout:
    1. Find an available time for checkout here.
    2. Verify that the tool is available in the LNF Online Services at the time you are requesting.
    3. After confirmation that the event is scheduled in Calendly, invite the staff member assigned to your event to a Staff Support reservation at that time.
  4. Create a helpdesk ticket for final confirmation of your checkout appointment.
  5. Authorization will be provided pending demonstration of proper tool use in the presence of a tool engineer.

Maintenance

Users are not allowed to carry out maintenance on the In-Line SEM. For issues with the tool, please contact the tool engineer or create a helpdesk ticket. Users are prohibited from trying to troubleshoot without authorization from the tool engineers. The users are, however, allowed to exit and restart the SEM software in case error messages pop up or the software freezes. Double click in the PC SEM icon on the desktop to launch the software. Provide the following Username and Password to launch:

  • Username - SU8000 (case sensitive)
  • Password - sysman (case sensitive)