June 2016 water damage

This page has been created to consolidate updates following the June 4th flood that occurred in EECS 1480 (new cleanroom space). Note that ROBIN and EECS 1440 (older part of the cleanroom) were not affected.

As of 6/4/16, all equipment in 1480 EECS is off-line and there is no user access to that area of the lab.

Facility status

No access to EECS 1480 (newer part of cleanroom)

Equipment status

Equipment	Status	Comments
Furnaces stacks 1, 2, 3, 4 and 5	Off-line
P5000 PECVD	Off-line
Lab 18-1	Off-line
Lab 18-2	Off-line
AlN sputtering tool	Off-line
PDS 2035	Off-line
AFM	Off-line
SEM	Off-line
Pegasus 4 and 6	Off-line
STS glass etcher	Off-line
P5000 RIE	Off-line
JEOL e-beam lithography	Off-line
YES plasma stripper	Off-line
Pre furnace clean bench	Off-line
Acid 02 bench	Off-line
Acid 12 bench	Off-line	See alternative below
Mask 13 bench	Off-line	See alternative below
Solvent 14 bench	Off-line	See alternative below
EB spinner 21 bench	Off-line
EB solvent 22 bench	Off-line
Acid 23 bench	Off-line

Alternative solutions and back up

Wet benches (Acid 12, Mask 13, and Solvent 14)

Tanks were added in Acid 72 for:

• Cr Etch
• Gold Etch
• Nanostrip
• BHF

These should be used instead of Acid 12 and Mask 13.

Solvent 84 should be used instead of Solvent 14. This bench should accommodate most of the processing.