Difference between revisions of "LAM 9400/Processes"
< LAM 9400
Jump to navigation
Jump to search
| Line 10: | Line 10: | ||
*[[{{PAGENAME}}/mnf_nitride1]] | *[[{{PAGENAME}}/mnf_nitride1]] | ||
*: An etch designed to be selective to oxide | *: An etch designed to be selective to oxide | ||
| − | *[[{{PAGENAME}}/ | + | *[[{{PAGENAME}}/LNF_Poly]] |
*: An etch designed for polysilicon | *: An etch designed for polysilicon | ||
Revision as of 14:56, 2 February 2016
The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.
Proccess List
- LAM 9400/Processes/mnf_oxide1
- A SiO2 etch
- LAM 9400/Processes/mnf_oxynite2
- A etch designed to etch oxide and nitride at similar rates
- LAM 9400/Processes/mnf_nitride1
- An etch designed to be selective to oxide
- LAM 9400/Processes/LNF_Poly
- An etch designed for polysilicon
