Difference between revisions of "LAM 9400/Processes"
< LAM 9400
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==Description== | ==Description== | ||
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The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched by user created recipes. | The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched by user created recipes. | ||
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===Proccess List=== | ===Proccess List=== | ||
*[[{{PAGENAME}}/mnf_oxide1]] | *[[{{PAGENAME}}/mnf_oxide1]] | ||
| + | *: A SiO<sub>2</sub> etch | ||
*[[{{PAGENAME}}/mnf_oxynite2]] | *[[{{PAGENAME}}/mnf_oxynite2]] | ||
| + | *: A etch designed to etch oxide and nitride at similar rates | ||
*[[{{PAGENAME}}/mnf_nitride1]] | *[[{{PAGENAME}}/mnf_nitride1]] | ||
| + | *: An etch designed to be selective to oxide | ||
*[[{{PAGENAME}}/POLY_ETCH_2]] | *[[{{PAGENAME}}/POLY_ETCH_2]] | ||
| + | *: An etch designed for polysilicon | ||
Revision as of 13:40, 20 April 2015
 Warning: | This page has not been released yet. |
Description
The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched by user created recipes.
Proccess List
- LAM 9400/Processes/mnf_oxide1
- A SiO2 etch
- LAM 9400/Processes/mnf_oxynite2
- A etch designed to etch oxide and nitride at similar rates
- LAM 9400/Processes/mnf_nitride1
- An etch designed to be selective to oxide
- LAM 9400/Processes/POLY_ETCH_2
- An etch designed for polysilicon
