Difference between revisions of "LAM 9400/Processes"

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*[[{{PAGENAME}}/mnf_nitride1]]
 
*[[{{PAGENAME}}/mnf_nitride1]]
 
*: An etch designed to be selective to oxide
 
*: An etch designed to be selective to oxide
*[[{{PAGENAME}}/POLY_ETCH_2]]
+
*[[{{PAGENAME}}/LNF_Poly]]
 
*: An etch designed for polysilicon
 
*: An etch designed for polysilicon
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*[[{{PAGENAME}}/LNF_Ti_thin]]
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*[[{{PAGENAME}}/LNF_Aluminum]]
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*[[{{PAGENAME}}/LNF_Al2O3]]
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*[[{{PAGENAME}}/LNF_TiN_sel_Al2O3]]
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*[[{{PAGENAME}}/LNF_HfO2]]

Latest revision as of 11:01, 8 November 2021

The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.

Proccess List