Difference between revisions of "LAM 9400/Processes"

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<!-- This should be created as a sub-page of a tool and list the processes available on the tool, which can then be detailed in individual process sub-pages -->
 
<!-- This should be created as a sub-page of a tool and list the processes available on the tool, which can then be detailed in individual process sub-pages -->
 
[[Category:Processes]]
 
[[Category:Processes]]
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The LAM 9400 has a variety of processes available.  There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.
  
==Description==
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===Proccess List===
 
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*[[{{PAGENAME}}/mnf_oxide1]]
Write a brief description of what this process is used for here.
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*: A SiO<sub>2</sub> etch
 
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*[[{{PAGENAME}}/mnf_oxynite2]]
{{BASEPAGENAME}}
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*: A etch designed to etch oxide and nitride at similar rates
 
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*[[{{PAGENAME}}/mnf_nitride1]]
{{#titleparts: LAM_9400/Processes | -1 }}
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*: An etch designed to be selective to oxide
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*[[{{PAGENAME}}/LNF_Poly]]
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*: An etch designed for polysilicon
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*[[{{PAGENAME}}/LNF_Ti_thin]]
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*[[{{PAGENAME}}/LNF_Aluminum]]
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*[[{{PAGENAME}}/LNF_Al2O3]]
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*[[{{PAGENAME}}/LNF_TiN_sel_Al2O3]]
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*[[{{PAGENAME}}/LNF_HfO2]]

Latest revision as of 11:01, 8 November 2021

The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.

Proccess List