Difference between revisions of "LAM 9400/Processes"
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<!-- This should be created as a sub-page of a tool and list the processes available on the tool, which can then be detailed in individual process sub-pages --> | <!-- This should be created as a sub-page of a tool and list the processes available on the tool, which can then be detailed in individual process sub-pages --> | ||
[[Category:Processes]] | [[Category:Processes]] | ||
| − | + | The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes. | |
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===Proccess List=== | ===Proccess List=== | ||
| − | [[{{PAGENAME}}/mnf_oxide1]] | + | *[[{{PAGENAME}}/mnf_oxide1]] |
| − | [[{{PAGENAME}}/ | + | *: A SiO<sub>2</sub> etch |
| + | *[[{{PAGENAME}}/mnf_oxynite2]] | ||
| + | *: A etch designed to etch oxide and nitride at similar rates | ||
| + | *[[{{PAGENAME}}/mnf_nitride1]] | ||
| + | *: An etch designed to be selective to oxide | ||
| + | *[[{{PAGENAME}}/LNF_Poly]] | ||
| + | *: An etch designed for polysilicon | ||
| + | *[[{{PAGENAME}}/LNF_Ti_thin]] | ||
| + | *[[{{PAGENAME}}/LNF_Aluminum]] | ||
| + | *[[{{PAGENAME}}/LNF_Al2O3]] | ||
| + | *[[{{PAGENAME}}/LNF_TiN_sel_Al2O3]] | ||
| + | *[[{{PAGENAME}}/LNF_HfO2]] | ||
Latest revision as of 11:01, 8 November 2021
The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.
Proccess List
- LAM 9400/Processes/mnf_oxide1
- A SiO2 etch
- LAM 9400/Processes/mnf_oxynite2
- A etch designed to etch oxide and nitride at similar rates
- LAM 9400/Processes/mnf_nitride1
- An etch designed to be selective to oxide
- LAM 9400/Processes/LNF_Poly
- An etch designed for polysilicon
- LAM 9400/Processes/LNF_Ti_thin
- LAM 9400/Processes/LNF_Aluminum
- LAM 9400/Processes/LNF_Al2O3
- LAM 9400/Processes/LNF_TiN_sel_Al2O3
- LAM 9400/Processes/LNF_HfO2
