Difference between revisions of "LAM 9400/Processes"

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<!-- This should be created as a sub-page of a tool and list the processes available on the tool, which can then be detailed in individual process sub-pages -->
 
<!-- This should be created as a sub-page of a tool and list the processes available on the tool, which can then be detailed in individual process sub-pages -->
 
[[Category:Processes]]
 
[[Category:Processes]]
 
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The LAM 9400 has a variety of processes available.  There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.
==Description==
 
 
 
Write a brief description of what this process is used for here.
 
 
 
Equipment: [[{{BASEPAGENAME}}]]
 
  
 
===Proccess List===
 
===Proccess List===
 
*[[{{PAGENAME}}/mnf_oxide1]]
 
*[[{{PAGENAME}}/mnf_oxide1]]
*[[{{PAGENAME}}/mnf_oxynit2]]
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*: A SiO<sub>2</sub> etch
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*[[{{PAGENAME}}/mnf_oxynite2]]
 +
*: A etch designed to etch oxide and nitride at similar rates
 +
*[[{{PAGENAME}}/mnf_nitride1]]
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*: An etch designed to be selective to oxide
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*[[{{PAGENAME}}/LNF_Poly]]
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*: An etch designed for polysilicon
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*[[{{PAGENAME}}/LNF_Ti_thin]]
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*[[{{PAGENAME}}/LNF_Aluminum]]
 +
*[[{{PAGENAME}}/LNF_Al2O3]]
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*[[{{PAGENAME}}/LNF_TiN_sel_Al2O3]]
 +
*[[{{PAGENAME}}/LNF_HfO2]]

Latest revision as of 11:01, 8 November 2021

The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.

Proccess List