Difference between revisions of "LAM 9400/Processes"
< LAM 9400
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| Line 12: | Line 12: | ||
*[[{{PAGENAME}}/LNF_Poly]] | *[[{{PAGENAME}}/LNF_Poly]] | ||
*: An etch designed for polysilicon | *: An etch designed for polysilicon | ||
| + | *[[{{PAGENAME}}/LNF_Ti_thin]] | ||
Revision as of 14:15, 19 June 2018
The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched via user created recipes.
Proccess List
- LAM 9400/Processes/mnf_oxide1
- A SiO2 etch
- LAM 9400/Processes/mnf_oxynite2
- A etch designed to etch oxide and nitride at similar rates
- LAM 9400/Processes/mnf_nitride1
- An etch designed to be selective to oxide
- LAM 9400/Processes/LNF_Poly
- An etch designed for polysilicon
- LAM 9400/Processes/LNF_Ti_thin
