Difference between revisions of "LAM 9400/Processes"

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==Description==
 
==Description==
 
 
The LAM 9400 has a variety of processes available.  There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched by user created recipes.
 
The LAM 9400 has a variety of processes available.  There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched by user created recipes.
Equipment: [[{{BASEPAGENAME}}]]
 
  
 
===Proccess List===
 
===Proccess List===
 
*[[{{PAGENAME}}/mnf_oxide1]]
 
*[[{{PAGENAME}}/mnf_oxide1]]
 +
*: A SiO<sub>2</sub> etch
 
*[[{{PAGENAME}}/mnf_oxynite2]]
 
*[[{{PAGENAME}}/mnf_oxynite2]]
 +
*: A etch designed to etch oxide and nitride at similar rates
 
*[[{{PAGENAME}}/mnf_nitride1]]
 
*[[{{PAGENAME}}/mnf_nitride1]]
 +
*: An etch designed to be selective to oxide
 
*[[{{PAGENAME}}/POLY_ETCH_2]]
 
*[[{{PAGENAME}}/POLY_ETCH_2]]
 +
*: An etch designed for polysilicon

Revision as of 12:40, 20 April 2015

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Description

The LAM 9400 has a variety of processes available. There are standard supported recipes for poly, oxide and nitride, although there are many more materials etched by user created recipes.

Proccess List