Difference between revisions of "LAM 9400/Processes/LNF Poly"
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[[Category:Processes]] [[Category:RIE]] | [[Category:Processes]] [[Category:RIE]] | ||
| − | LNF_Poly is designed for etching | + | LNF_Poly is designed for etching [[Silicon|Si]] and [[Polysilicon]] in the LAM 9400. This recipe produces a very vertical sidewall angle and has a high selectively to oxide (~18:1). |
==Etch Rates== | ==Etch Rates== | ||
| − | *Si - 2800 Å/min | + | * Polysilicon - 2340 Å/min (blanket 150mm poly) |
| + | *Si - 2800 Å/min (<10% open area) | ||
*SPR 220 (3.0) - 275 Å/min | *SPR 220 (3.0) - 275 Å/min | ||
*SiO<sub>2</sub> - 150 Å/min | *SiO<sub>2</sub> - 150 Å/min | ||
| Line 22: | Line 23: | ||
|height=400 | |height=400 | ||
|border=0 | |border=0 | ||
| − | } | + | }} |
==Parameters== | ==Parameters== | ||
| Line 61: | Line 62: | ||
==Sidewall Profile== | ==Sidewall Profile== | ||
| − | + | * Nearly a 90 degree sidewall angle | |
| + | |||
| + | <gallery mode="packed-hover" heights="300px"> | ||
| + | File:LAM_9400_LNF_Poly_2um_grating.jpg|LNF_Poly for 600 sec, 2 µm grating | ||
| + | File:LAM_9400_LNF_Poly_10um_grating.jpg|LNF_Poly for 600 sec, 10 µm grating | ||
| + | </gallery> | ||
==Limitations== | ==Limitations== | ||
| + | To remove the photoresist a ~20 sec dip in 100:1 HF is necessary before nanostrip. | ||
Revision as of 12:41, 20 October 2021
| About this Process | |
|---|---|
| Process Details | |
| Equipment | LAM 9400 |
| Technology | RIE |
| Material | Poly |
| Mask Materials | PR |
| Gases Used | HBr, He |
| Date Created | 2016 |
LNF_Poly is designed for etching Si and Polysilicon in the LAM 9400. This recipe produces a very vertical sidewall angle and has a high selectively to oxide (~18:1).
Etch Rates
- Polysilicon - 2340 Å/min (blanket 150mm poly)
- Si - 2800 Å/min (<10% open area)
- SPR 220 (3.0) - 275 Å/min
- SiO2 - 150 Å/min
Parameters
| Parameter | Breakthrough | Main Etch |
|---|---|---|
| Time | 10 sec | variable |
| Pressure | 5 mTorr | 30 mTorr |
| TCP Power | 300 W | 600 W |
| Bias Power | 100 W | 90 W |
| Cl2 Flow | 60 sccm | 0 sccm |
| HBr Flow | 0 sccm | 100 sccm |
| He Flow | 0 sccm | 100 sccm |
Sidewall Profile
- Nearly a 90 degree sidewall angle
LNF_Poly for 600 sec, 2 µm grating
LNF_Poly for 600 sec, 10 µm grating
Limitations
To remove the photoresist a ~20 sec dip in 100:1 HF is necessary before nanostrip.
