Difference between revisions of "LAM 9400/Processes/LNF Poly"

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==Sidewall Profile==
 
==Sidewall Profile==
 +
* Nearly a 90 degree sidewall angle
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<gallery mode="packed-hover"  heights="300px">
 
<gallery mode="packed-hover"  heights="300px">
 
File:LAM_9400_LNF_Poly_2um_grating.jpg|LNF_Poly for 600 sec, 2 µm grating
 
File:LAM_9400_LNF_Poly_2um_grating.jpg|LNF_Poly for 600 sec, 2 µm grating

Revision as of 15:47, 8 February 2016


About this Process
Process Details
Equipment LAM 9400
Technology RIE
Material Poly
Mask Materials PR
Gases Used HBr, He
Date Created 2016

LNF_Poly is designed for etching si and polysilicon in the LAM 9400. This recipe is currently under development and will replace poly_etch_2 as it does not have the same stability problems.

Etch Rates

  • Si - 2800 Å/min
  • SPR 220 (3.0) - 275 Å/min
  • SiO2 - 150 Å/min

Parameters

Parameter Breakthrough Main Etch
Time 10 sec variable
Pressure 5 mTorr 30 mTorr
TCP Power 300 W 600 W
Bias Power 100 W 90 W
Cl2 Flow 60 sccm 0 sccm
HBr Flow 0 sccm 100 sccm
He Flow 0 sccm 100 sccm

Sidewall Profile

  • Nearly a 90 degree sidewall angle

Limitations