Difference between revisions of "LNF PVD Films"

From LNF Wiki
Jump to navigation Jump to search
 
(24 intermediate revisions by 2 users not shown)
Line 4: Line 4:
  
 
←[[PVD 75 Proline|Back to PVD 75]]'''
 
←[[PVD 75 Proline|Back to PVD 75]]'''
 +
 +
←[[Endeavor M1 AlN Sputter Tool|Back to Endeavor M1 AlN Sputter Tool]]'''
  
 
←[[Enerjet Evaporator|Back to Enerjet Evaporator]]'''
 
←[[Enerjet Evaporator|Back to Enerjet Evaporator]]'''
Line 9: Line 11:
 
←[[Cooke Evaporator|Back to Cooke Evaporator]]'''
 
←[[Cooke Evaporator|Back to Cooke Evaporator]]'''
  
←[[SJ-20 Evaporator|Back to Lab 18-1]]'''
+
←[[SJ-20 Evaporator|Back to SJ-20 Evaporator]]'''
  
 
←[[Angstrom Engineering Evovac Evaporator|Back to AE Evaporator]]'''
 
←[[Angstrom Engineering Evovac Evaporator|Back to AE Evaporator]]'''
  
 
==PVD Materials Supported for General Use==
 
==PVD Materials Supported for General Use==
These are the PVD films currently supported in the LNF with maximum thicknesses listed.  
+
These are the PVD films currently supported in the LNF with maximum thicknesses listed.
 +
 
 +
*In the evaporators, maximum thickness numbers are total thickness of that material per run.
 +
**They are determined by stress or material availible.
 +
**If you run multiple layers of the same material, the sum total thickness of those layers must be below the maximum.
 +
 
 +
{{#widget:Iframe
 +
|url=https://docs.google.com/spreadsheets/d/e/2PACX-1vSXRO6Hh4TBIMftMEUdSSFVKoVpaz8E6HH9omAHarKv2eM2bke5kGq1kSodyzVTfUOeq8wyfNRKuzSt/pubhtml?gid=1096675531&single=true
 +
|width=930
 +
|height=1010
 +
|border=5
 +
}}
  
==Requesting New Materials==
+
==Requesting to Add New PVD Materials==
 
If you do not see the film you need, you can request a new material to use as a private source.   
 
If you do not see the film you need, you can request a new material to use as a private source.   
*Unless there is a specific need, new materials will be added to the AE Evaporator or the PVD-75.
+
*'''Unless there is a specific need, new materials will be added to the AE Evaporator or the PVD-75.'''
 +
*The goal is to reduce contamination and down-time by keeping user-source rotation to a minimum on the more "standard," precious-metals-supporting tools ([http://lnf-wiki.eecs.umich.edu/wiki/Lab_18-2 Lab 18-2], [http://lnf-wiki.eecs.umich.edu/wiki/EnerJet_Evaporator EnerJet]) and tools that support optical films ([http://lnf-wiki.eecs.umich.edu/wiki/Lab_18-1 Lab 18-1]) and contact films. ([http://lnf-wiki.eecs.umich.edu/wiki/SJ-20_Evaporator SJ-20]) 
  
 
===Procedure for requesting a new material===
 
===Procedure for requesting a new material===
 
====Get the Material Approved====
 
====Get the Material Approved====
*Create a request using the [https://docs.google.com/a/lnf.umich.edu/forms/d/e/1FAIpQLSfEvrvh-iNqvC1Ghi8jfDwMWz7NHqKtJc4DFF7zJJlU4HmTeQ/viewform New PVD Material Request Form].
+
*Make a request using the [https://docs.google.com/a/lnf.umich.edu/forms/d/e/1FAIpQLSfEvrvh-iNqvC1Ghi8jfDwMWz7NHqKtJc4DFF7zJJlU4HmTeQ/viewform New PVD Material Request Form].
 
*Create a helpdesk ticket to inform LNF staff of your request, and to provide us with a forum to communicate with you.
 
*Create a helpdesk ticket to inform LNF staff of your request, and to provide us with a forum to communicate with you.
 
*Your request will be reviewed by the LNF management and staff.  
 
*Your request will be reviewed by the LNF management and staff.  
*This process can; in some cases, take up to a month to complete.  
+
*This process can, in some cases, take up to a month to complete.  
*Even if you have other materials approved, you must complete a New PVD Material Request form for every new material you bring into the PVD tools.
+
*You must complete a New PVD Material Request form for every new material you bring into the PVD tools.
  
 
====Ordering the Material and any Private Shielding or Crucibles====
 
====Ordering the Material and any Private Shielding or Crucibles====
 
*'''Target dimensions or Evaporation Material volume and shape''': Once the material is approved, LNF staff will get you the information on target dimensions and any source requirements.  Some targets may require bonding to a backing plate.  Some evaporated materials may require a solid source.   
 
*'''Target dimensions or Evaporation Material volume and shape''': Once the material is approved, LNF staff will get you the information on target dimensions and any source requirements.  Some targets may require bonding to a backing plate.  Some evaporated materials may require a solid source.   
*'''Material Purity''': In order to support this high standard of process dependability, we require that all sources used in the sputter systems below in impurities. Purity set related terms used in the metals market is, “nines”. In the case of LNF, we require materials to have a purity value of 99.995% or greater. This is often described as, “Four Nines Five” and typically written as “4N5”. In cases where 4N5 materials are not available, contact an LNF staff to discuss your options.
+
*'''Material Purity''': In order to support a high standard of process dependability, we require that all sources used have a purity value of 99.995% or greater. This is often described as, “Four Nines Five” and typically written as “4N5”. In cases where 4N5 materials are not available, contact an LNF staff to discuss your options.
*'''Dedicated Shielding and Crucibles''': Users requesting new sputter materials will need to buy dedicated shielding for the material.  New evaporation material requests may be requested to buy a dedicated crucible for the material.
+
*'''Dedicated Shielding and Crucibles''': Users requesting new sputter materials will need to buy dedicated shielding for the material.  New evaporation materials users may be requested to buy a dedicated crucible for that material.
  
 +
==Support==
  
 
+
===Co-sputtering Need for Private Shields===
See the [https://docs.google.com/document/d/1T-JDOeYIBeJ12SZRkltomyBGlZhSxQsC2qjnemXHMpo/view Requesting a new material] tutorial for specifics.
 
 
 
==Support==
 
 
Due to issues of cross-contamination, process development of co-sputtered films will require the purchase of private targets and shields.
 
Due to issues of cross-contamination, process development of co-sputtered films will require the purchase of private targets and shields.
===Superuser access provides access to ===
 
  
 +
===KJLC Lab 18 Superuser access provides access to ===
 
*Target change
 
*Target change
 
*Modify and run VP (variable parameter) recipes
 
*Modify and run VP (variable parameter) recipes
Line 57: Line 69:
  
 
===Private Shields===
 
===Private Shields===
*Each material requires a designated shield for processing.
+
*Each sputter material requires a designated shield for processing.
 
*# This is to prevent cross-contamination, and provide a more reliable maintenance schedule
 
*# This is to prevent cross-contamination, and provide a more reliable maintenance schedule
 
*# Storage and cleaning is the responsibility of the developer.  
 
*# Storage and cleaning is the responsibility of the developer.  

Latest revision as of 16:36, 19 November 2020

Back to Lab 18-1

Back to Lab 18-2

Back to PVD 75

Back to Endeavor M1 AlN Sputter Tool

Back to Enerjet Evaporator

Back to Cooke Evaporator

Back to SJ-20 Evaporator

Back to AE Evaporator

PVD Materials Supported for General Use

These are the PVD films currently supported in the LNF with maximum thicknesses listed.

  • In the evaporators, maximum thickness numbers are total thickness of that material per run.
    • They are determined by stress or material availible.
    • If you run multiple layers of the same material, the sum total thickness of those layers must be below the maximum.

Requesting to Add New PVD Materials

If you do not see the film you need, you can request a new material to use as a private source.

  • Unless there is a specific need, new materials will be added to the AE Evaporator or the PVD-75.
  • The goal is to reduce contamination and down-time by keeping user-source rotation to a minimum on the more "standard," precious-metals-supporting tools (Lab 18-2, EnerJet) and tools that support optical films (Lab 18-1) and contact films. (SJ-20)

Procedure for requesting a new material

Get the Material Approved

  • Make a request using the New PVD Material Request Form.
  • Create a helpdesk ticket to inform LNF staff of your request, and to provide us with a forum to communicate with you.
  • Your request will be reviewed by the LNF management and staff.
  • This process can, in some cases, take up to a month to complete.
  • You must complete a New PVD Material Request form for every new material you bring into the PVD tools.

Ordering the Material and any Private Shielding or Crucibles

  • Target dimensions or Evaporation Material volume and shape: Once the material is approved, LNF staff will get you the information on target dimensions and any source requirements. Some targets may require bonding to a backing plate. Some evaporated materials may require a solid source.
  • Material Purity: In order to support a high standard of process dependability, we require that all sources used have a purity value of 99.995% or greater. This is often described as, “Four Nines Five” and typically written as “4N5”. In cases where 4N5 materials are not available, contact an LNF staff to discuss your options.
  • Dedicated Shielding and Crucibles: Users requesting new sputter materials will need to buy dedicated shielding for the material. New evaporation materials users may be requested to buy a dedicated crucible for that material.

Support

Co-sputtering Need for Private Shields

Due to issues of cross-contamination, process development of co-sputtered films will require the purchase of private targets and shields.

KJLC Lab 18 Superuser access provides access to

  • Target change
  • Modify and run VP (variable parameter) recipes
  • Create and support private recipes
  • Support and train colleagues
  • Custom film development
    1. Reactive sputtering
    2. Heated recipes (up to 350°C)
    3. Co-Sputtered films
    4. Applied bias voltages

Private Materials

  • All privately supported materials in the LNF are developer supported
    1. Storage, cleaning, burn-in, and recipe development is the responsibility of the owner
    2. The LNF in collaboration with OSEH can assist with the disposal of these materials

Private Shields

  • Each sputter material requires a designated shield for processing.
    1. This is to prevent cross-contamination, and provide a more reliable maintenance schedule
    2. Storage and cleaning is the responsibility of the developer.