LNF PVD Films
- 1 PVD Materials Supported for General Use
- 2 Requesting to Add New PVD Materials
- 3 Support
PVD Materials Supported for General Use
These are the PVD films currently supported in the LNF with maximum thicknesses listed.
Requesting to Add New PVD Materials
If you do not see the film you need, you can request a new material to use as a private source.
- Unless there is a specific need, new materials will be added to the AE Evaporator or the PVD-75.
Procedure for requesting a new material
Get the Material Approved
- Make a request using the New PVD Material Request Form.
- Create a helpdesk ticket to inform LNF staff of your request, and to provide us with a forum to communicate with you.
- Your request will be reviewed by the LNF management and staff.
- This process can; in some cases, take up to a month to complete.
- Even if you have other materials approved, you must complete a New PVD Material Request form for every new material you bring into the PVD tools.
Ordering the Material and any Private Shielding or Crucibles
- Target dimensions or Evaporation Material volume and shape: Once the material is approved, LNF staff will get you the information on target dimensions and any source requirements. Some targets may require bonding to a backing plate. Some evaporated materials may require a solid source.
- Material Purity: In order to support a high standard of process dependability, we require that all sources used have a purity value of 99.995% or greater. This is often described as, “Four Nines Five” and typically written as “4N5”. In cases where 4N5 materials are not available, contact an LNF staff to discuss your options.
- Dedicated Shielding and Crucibles: Users requesting new sputter materials will need to buy dedicated shielding for the material. New evaporation materials users may be requested to buy a dedicated crucible for that material.
Due to issues of cross-contamination, process development of co-sputtered films will require the purchase of private targets and shields.
Superuser access provides access to
- Target change
- Modify and run VP (variable parameter) recipes
- Create and support private recipes
- Support and train colleagues
- Custom film development
- Reactive sputtering
- Heated recipes (up to 350°C)
- Co-Sputtered films
- Applied bias voltages
- All privately supported materials in the LNF are developer supported
- Storage, cleaning, burn-in, and recipe development is the responsibility of the owner
- The LNF in collaboration with OSEH can assist with the disposal of these materials
- Each sputter material requires a designated shield for processing.
- This is to prevent cross-contamination, and provide a more reliable maintenance schedule
- Storage and cleaning is the responsibility of the developer.