View source for LNF Sputter Adding New Films

&larr;[[Lab_18-1|Back to Lab 18-1]]

&larr;[[Lab_18-2|Back to Lab 18-2]]

&larr;[[PVD 75 Proline|Back to PVD 75]]

The LNF sputter systems have three access categories: user, technician, and superuser.  User level access allows access to the standard recipes whereas technicians and superuser access involves training on changing targets and modifying recipe conditions.

==Requesting New Materials==

This program is meant to promote a stable set of variables allowed in the PVD systems to aid research. 

*Create a request using the [https://docs.google.com/a/lnf.umich.edu/forms/d/e/1FAIpQLSfEvrvh-iNqvC1Ghi8jfDwMWz7NHqKtJc4DFF7zJJlU4HmTeQ/viewform New Sputter Material Request Form].
*Create a helpdesk ticket to inform LNF staff of your request, and to provide us with a forum to communicate with you.
*Your request will be reviewed by the LNF management and staff.
*This process can; in some cases, take up to a month to complete.

See the [https://docs.google.com/document/d/1T-JDOeYIBeJ12SZRkltomyBGlZhSxQsC2qjnemXHMpo/view Requesting a new material] tutorial for specifics.

==Source Requirements==
[https://docs.google.com/document/d/1297-5eFdidtdaJpOSoPE0r_Ogqx0XAjAbBFel-lIrr4/view Private and Co-Sputtering at the LNF]

[http://www.lesker.com/newweb/deposition_materials/depositionmaterials_technicalnotes_1.cfm?pgid=0 Sputter Targets Technical Notes]

===Ultra-High Purity Materials===
In order to support this high standard of process dependability, we require that all sources used in the sputter systems below in impurities. Purity set related terms used in the metals market is, “nines”. In the case of LNF, we require materials to have a purity value of 99.995% or greater. This is often described as, “Four Nines Five” and typically written as “4N5”. In cases where 4N5 materials are not available, contact an LNF staff to discuss your options.

===TORUS® Circular HV (High Vacuum) Magnetron Sputtering Sources===

[http://www.lesker.com/newweb/deposition_sources/torus_sputtercathodes_circularhv.cfm TORUS® Magnetron Sputtering Sources]

*These sources are in the Lab 18's. Each material requires a designated source shield for operation.

{| class="wikitable" border="1"
|-
!TORUS Source Model
!Target Diameter
!Thickness 
(Non-Magnetic)
!Thickness 
(Ferromagnetic Materials)
|-
|TORUS 3                    
(Model TRS3 & TM03)
|3" +/-0.020"
|0.050"- 0.255"
|Fe: 0.08" Max (HSMA**)                              
Co: 0.125" Max (HSMA**)                               
Ni: 0.125" (SMA***) or 0.250" Max (HSMA**)
|-
|}

===TORUS® Mag Keeper™===

[http://www.lesker.com/newweb/deposition_sources/torus_sputtercathodes_circularmagkeeper.cfm Mag Keeper]

*These sources are in the PVD 75. These do not require a private source shield.
*Non-magnetic sources require a [http://www.lesker.com/newweb/deposition_sources/pdf/kjlc-targetguide-magkeeper.pdf Target Keeper]

==Support==
Due to issues of cross-contamination, process development of co-sputtered films will require the purchase of private targets and shields.
===Superuser access provides access to===

*Target change
*Modify and run VP (variable parameter) recipes
*Create and support private recipes
*Support and train colleagues
*Custom film development
*#Reactive sputtering
*#Heated recipes (up to 350°C)
*#Co-Sputtered films
*#Applied bias voltages

===Private Materials===

*All privately supported materials in the LNF are developer supported
*#Storage, cleaning, burn-in, and recipe development is the responsibility of the owner
*#The LNF in collaboration with OSEH can assist with the disposal of these materials

===Private Shields===

*Each material requires a designated shield for processing.
*#This is to prevent cross-contamination, and provide a more reliable maintenance schedule
*#Storage and cleaning is the responsibility of the developer. 

[[Category:PVD equipment]]